ST0515 Hafnium Oxide with Yttrium Oxide Sputtering Target, HfO2/Y2O3

Hafnium Oxide with Yttrium Oxide Sputtering Target Description

Hafnium is a lustrous, silvery gray, tetravalent transition metal, hafnium chemically resembles zirconium and is found in many zirconium minerals. Its existence was predicted by Dmitri Mendeleev in 1869, though it was not identified until 1923, by Coster and Hevesy, making it the last stable element to be discovered. Hafnium is named after Hafnia, the Latin name for Copenhagen, where it was discovered.

Yttrium is a chemical element that originated from Ytterby, Sweden. It was first mentioned in 1794 and observed by J. Gadolin. The isolation was later accomplished and announced by G. Mosander. “Y” is the canonical chemical symbol of yttrium. Its atomic number in the periodic table of elements is 39 with location at Period 5 and Group 3, belonging to the d-block. The relative atomic mass of yttrium is 88.90585(2) Dalton, the number in the brackets indicating the uncertainty.

Related Product: Hafnium Sputtering Target, Yttrium Sputtering Target.

Hafnium Oxide with Yttrium Oxide Sputtering Target Specifications

We also offer other customized shapes and sizes of the sputtering targets, please inquire for more information.

Hafnium Oxide with Yttrium Oxide Sputtering Target Packing

Our Hafnium Oxide with Yttrium Oxide Sputtering Targets are clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.

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SAM’s hafnium oxide with yttrium oxide sputter targets are available in various forms, purities, sizes, and prices. We specialize in producing high-purity physical vapor deposition (PVD) materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD), and physical vapor deposition (PVD) display and optical applications.