Chemical Formula: Hf
Catalog Number: ST0019
CAS Number: 7440-58-6
Purity: 99.9%
Shape: Discs, Plates, Column Targets, Step Target, Custom-made
Stanford Advanced Materials (SAM) offers high-quality hafnium sputtering targets for thin film deposition applications. With decades of experience, SAM ensures consistent quality and competitive pricing, making us a trusted partner for research and industrial production.
Hafnium Sputtering Target Safety Data Sheet
The hafnium sputtering target possesses the same properties as hafnium metal, including its high melting point, excellent corrosion resistance, and compatibility with standard sputtering systems.
Hafnium, with the chemical symbol Hf, was discovered in Copenhagen (Hafnia in Latin) and belongs to the group of transition metals. Known for its silvery-gray luster, hafnium is a versatile material used across industries, especially in semiconductor manufacturing, optical coatings, and nuclear technologies. Its ability to produce uniform thin films makes it ideal for both research and industrial applications.
Technical Specifications
| Material Type | Hafnium (Hf) |
| Chemical Formula | Hf |
| CAS Number | 7440-58-6 |
| Atomic Number | 72 |
| Density | 13.31 g/cc |
| Melting Point | 2227 °C |
| Coefficient of Expansion | 5.9 x 10⁻⁶/K |
| Thermal Conductivity | 23 W/m.K |
| Purity | 99.9% |
| Sputtering Method | DC Sputtering |
Standard Dimensions and Customization Options
| Shape | Diameter/Dimensions | Thickness | Customization |
|---|---|---|---|
| Circular Targets | 1.0″ – 18.0″ | 0.125″, 0.250″ | Available |
| Rectangular Targets | 5″ x 12″, 5″ x 15″, 6″ x 20″ | 0.125″, 0.250″ | Available |
| Bonded Targets | Indium/Elastomer Bonded | Customizable | Yes |
For customized service, please send us an inquiry for more details.
Hafnium sputtering targets are ideal for producing thin films through both DC sputtering and reactive sputtering. Common applications include:
Hafnium Sputter Targets can be bonded by Indium Bonding and Elastomer Bonding. Stanford Advanced Materials is devoted to machining standard backing plates and working together with the Taiwan Bonding Company for providing bonding services. For questions about target bonding materials, methods and services, please click here.
Hf sputter target is clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.
High purity Hafnium sputtering targets are good magnetron sputtering materials. They are available in various forms, purities, sizes, and prices. We specialize in producing high purity thin film coating materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Please send us an inquiry for current pricing on sputtering targets and other deposition materials not listed.
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I needed a customized hafnium target for a specific project, and SAM delivered exactly what I needed. The quality was excellent, and the target produced uniform coatings with no issues. Their team was very responsive and helpful throughout the process. Definitely a trusted supplier.
The hafnium sputtering target I ordered from SAM has been outstanding. The material quality is top-notch, and the dimensions were exactly as specified. It performed perfectly in my thin film deposition experiments. Quick delivery and great customer support made the experience even better. Highly recommended!
Great sputtering materials for my lab. Great quality, amazing price.
I love all of my stuff from SAM.
