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What is typical source to substrate distance in a magnetron sputtering process?

2” to 8” depending on the size of source, the size of the substrate, the film density required and the film uniformityrequired.

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Julissa Green graduated from the University of Texas studying applied chemistry. She started her journalism life as a chemistry specialist in Stanford Advanced Materials (SAM) since 2016 and she has been fascinated by this fast growing industry ever since. If you have any particular topics of interest, or you have any questions, you can reach her at julissa@samaterials.com.

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