Chemical Formula: AlTe
Catalog Number: ST0317
CAS Number: 23330-86-1
Purity: 99.9%, 99.95%, 99.99%, 99.995%, 99.999%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made
The aluminum telluride sputtering target is available in various forms, purities, sizes, and prices. Stanford Advanced Materials (SAM) offers high-quality aluminum telluride sputter targets at the most competitive prices.
Aluminum telluride sputtering target is a type of telluride ceramic sputtering target composed of aluminum and tellurium.
Aluminum, also called aluminum, is a chemical element originated from the Latin name for alum, ‘alumen’ meaning bitter salt. It was first mentioned in 1825 and observed by H.C.Ørsted. The isolation was later accomplished and announced by H.C.Ørsted. “Al” is the canonical chemical symbol of aluminum. Its atomic number in the periodic table of elements is 13 with location at Period 3 and Group 13, belonging to the p-block. The relative atomic mass of aluminum is 26.9815386(8) Dalton, the number in the brackets indicating the uncertainty.
Related Product: Aluminum Sputtering Target
Tellurium is a chemical element originated from Earth, the third planet on solar system (with the Latin word tellus). It was first mentioned in 1782 and observed by F.-J.M. von Reichenstein. The isolation was later accomplished and announced by H. Klaproth. “Te” is the canonical chemical symbol of tellurium. Its atomic number in the periodic table of elements is 52 with location at Period 5 and Group 16, belonging to the p-block. The relative atomic mass of tellurium is 127.60(3) Dalton, the number in the brackets indicating the uncertainty.
Related Product: Telluride Ceramic Sputtering Target
| Compound Formula | Al2Te3 |
| Molecular Weight | 436.76 |
| Appearance | Dark grey or black |
| Melting Point | 900 °C |
| Boiling Point | N/A |
| Density | 4.5 g/cm3 |
| Available Sizes | Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″ Thick: 0.125″, 0.250″ |
Our aluminum telluride sputtering targets are clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.
SAM’s aluminum telluride sputtering targets are available in various forms, purities, and sizes. We specialize in producing high purity physical vapor deposition (PVD) materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Get an inquiry right now.
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Worked perfect for my project and I would definitely buy them again if needed.
