| Catalog No. | VD0806 |
|---|---|
| Material | Tantalum Silicide (TaSi2) |
| Purity | 99.5% |
| Shape | Powder/ Granule/ Custom-made |
Tantalum silicide evaporation material from Stanford Advanced Materials is a silicide ceramic evaporation material with the chemical formula TaSi2. High-purity TaSi2 evaporation materials play a huge role in deposition processes to ensure high-quality deposited film. Stanford Advanced Materials (SAM) specializes in producing up to 99.9995% purity evaporating materials using quality assurance processes to guarantee product reliability.
Related Product: Tantalum Evaporation Materials, Silicide Ceramic Evaporation Materials
Tantalum silicide evaporation materials are used in deposition processes including semiconductor deposition, chemical vapor deposition (CVD), and physical vapor deposition (PVD), and mainly for optics including wear protection, decorative coatings, and displays.
Tantalum silicide evaporation materials are clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.
Stanford Advanced Materials (SAM) is a leading manufacturer and supplier of high-purity tantalum silicide evaporation materials evaporating materials. Various shapes, such as tablets, granules, rods, and wires are available. Customized forms and quantities are also available upon request. SAM also provides evaporation sources, boats, filaments, crucibles and heaters, and e-beam crucible liners. Please send us an inquiry for the current prices of the evaporation materials and other materials that are not listed.
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Arrived as stated. Are just what I need to use with my sputtering machine.
