Chemical Formula: NbS
Catalog Number: ST0524
CAS Number: 12164-38-4
Purity: 99.9%, 99.95%, 99.99%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made
SAM’s Niobium Sulfide Sputter Targets are available in various forms, purities, sizes, and prices. We specialize in producing high-purity physical vapor deposition (PVD) materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD), and physical vapor deposition (PVD) display and optical applications.
Niobium Sulfide (Nb2S5) Sputtering Targets are essential materials in thin film deposition processes, widely used in semiconductor, optical, and electronics industries. Stanford Advanced Materials (SAM) offers high-quality Niobium Sulfide Sputtering Targets designed to meet your precise requirements, enabling precise and reliable thin-film coatings with exceptional performance.
Related Product: Niobium Sputtering Target.
Material | Niobium Sulfide (Nb2S5) |
---|---|
Purity | 99.9% and above |
Shape | Discs, Plates, Custom Shapes, or as per your specifications |
Size | Dia.: 2.0″, 3.0″, 4.0″, 5.0″, 6.0″ Thick: 0.125″, 0.250″ |
Sputtering Target Bonding Options | Indium, Elastomer, or Customized |
Surface Roughness | As machined or as required |
Melting Point | Approximately 1,040°C |
Available Documents | Certificate of Analysis (COA), Material Safety Data Sheet (MSDS), and Customized Documents |
We also offer other customized shapes and sizes of the sputtering targets, please send us an inquiry for more information.
Our Niobium Sulfide Sputtering Targets are suitable for a wide range of applications, including:
Our Niobium Sulfide Sputtering Targets are tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.
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These are perfect for ANY PVD coating project you might have. Will buy again. Thanks.