Chemical Formula: As2S3
Catalog Number: ST0526
Purity: 99.9%, 99.95%, 99.99%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made
SAM’s Arsenic Trisulfide Sputter Targets are available in various forms, purities, sizes, and prices. We specialize in producing high-purity physical vapor deposition (PVD) materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD), and physical vapor deposition (PVD) display and optical applications.
Arsenic Trisulfide (As2S3) Sputtering Targets play a vital role in thin film deposition processes, particularly in the semiconductor and optical coating industries. Stanford Advanced Materials (SAM) offers high-quality Arsenic Trisulfide Sputtering Targets, meticulously designed to meet your specific requirements, enabling precise and reliable thin-film coatings.
| Material | Arsenic Trisulfide (As2S3) |
|---|---|
| Purity | 99.9% and above |
| Shape | Discs, Plates, Custom Shapes, or as per your specifications |
| Dimensions | Dia.: 2.0″, 3.0″, 4.0″, 5.0″, 6.0″ Thick: 0.125″, 0.250″ |
| Sputtering Target Bonding Options | Indium, Elastomer, or Customized |
| Surface Roughness | As machined or as required |
| Melting Point | Approximately 312°C |
| Available Documents | Certificate of Analysis (COA), Material Safety Data Sheet (MSDS), and Customized Documents |
We also offer other customized shapes and sizes of the sputtering targets, please send us an inquiry for more information.
Our Arsenic Trisulfide Sputtering Targets find applications in various industries, including:
Our Arsenic Trisulfide Sputtering Targets are tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.
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So much high quality for such a cheap price. Came exactly as described and good quality.
