| Chemical Composition | Cr, Al, Si |
| Purity | 99.9% |
| Shape | Planar Disc |
The CrSiAl Target is an advanced alloy sputtering material that integrates chromium’s exceptional hardness, silicon’s thermal stability, and aluminum’s resistance to oxidation. This combination results in a target that delivers excellent performance in thin film deposition processes, ensuring durability and reliability in demanding environments. The homogeneous microstructure achieved through precise alloying and casting techniques ensures stable sputtering behavior and uniform film composition. The CrSiAl Target maintains a moderate melting point and exhibits good thermal expansion compatibility with various substrates, making it suitable for controlled temperature applications. Its low internal stress, strong bonding characteristics, and stable surface morphology contribute to dependable performance during extended sputtering operations.
Related Products: Chromium Sputtering Target, Cr, Chromium Nickel Sputtering Target, Cr/Ni, N-type Silicon Sputtering Target (N-doped Si), Aluminum Silicon Copper Sputtering Target, Al/Si/Cu, Aluminum Sputtering Target, Al, Aluminum Copper Sputtering Target, Al/Cu,
Chemical Composition: Cr, Al, Si
Purity: 99.9%
Shape: Planar Disc
Please note that the specifications provided are based on theoretical data. For customized specifications and detailed inquiries, please contact us directly.
The CrSiAl Target is versatile and finds applications in various advanced thin film technologies due to its superior hardness, thermal stability, and oxidation resistance. Key applications include:
Our CrSiAl Targets are carefully packaged to ensure their integrity during transportation. Depending on the size and dimensions, smaller targets are securely placed in polypropylene (PP) boxes, while larger ones are shipped in custom-built wooden crates. We prioritize customized packaging solutions and use appropriate cushioning materials to provide maximum protection during transit.
Packaging Options:
Q1: What are the advantages of using CrSiAl for thin film deposition?
A1: CrSiAl targets offer excellent hardness, high thermal and oxidation resistance, and stable sputtering behavior, making them ideal for protective, decorative, and functional coatings in demanding environments.
Q2: What deposition methods are compatible with CrSiAl Targets?
A2: CrSiAl Targets are suitable for both DC and RF magnetron sputtering systems and can be used in reactive or non-reactive atmospheres, depending on the desired film characteristics.
Q3: Can the target be customized in terms of size and composition?
A3: Yes, Stanford Advanced Materials provides CrSiAl targets in various sizes, shapes (planar or rotary), and compositions tailored to specific research or industrial requirements.
| Property | CrSiAl Target | Pure Cr Target | Pure Al Target | CrAl Alloy Target |
|---|---|---|---|---|
| Purity | ≥99.9% | ≥99.9% | ≥99.99% (HPA applications) | ≥99.5% |
| Electrical Conductivity | Moderate (alloy-dependent) | High | Very High | Moderate-High |
| Thermal Conductivity | 80-120 W/m·K | 90 W/m·K | 237 W/m·K | 70-100 W/m·K |
| Thermal Stability | Excellent (up to 1200°C) | Good (up to 800°C) | Moderate (melts at ~660°C) | Good (up to 1000°C) |
| Oxidation Resistance | High (forms protective SiO₂ layer) | Low (oxidizes at high T) | Low (forms Al₂O₃ but prone to spalling) | Moderate (depends on Al content) |
| Deposition Rate | Moderate | High | High | Moderate |
| Film Uniformity | Excellent (nanoscale control) | Good | Good | Good |
| Adhesion Strength | High (alloy bonding) | High | Moderate (requires bonding layers) | High |
| Cost | Medium-High (alloy complexity) | Low | Low | Medium |
| Primary Applications | Semiconductor, optical coatings | Wear-resistant coatings | Aerospace, electronics | Aerospace, automotive |
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