Material | Ta, Nb |
Purity | 99.95% |
Shape | Planar Disc |
The TaNb Target is a premium alloy sputtering material that combines the outstanding corrosion resistance and high melting point of tantalum with niobium’s exceptional mechanical properties and superconducting abilities. This alloy delivers remarkable thermal stability, maintaining its integrity and performance even at elevated temperatures. Tantalum enhances the material’s resistance to oxidation and chemical corrosion, while niobium boosts the alloy’s strength and introduces superconducting properties, making it suitable for specialized applications in electronics and aerospace industries. The TaNb Target exhibits excellent thermal and electrical conductivity along with superior mechanical strength, ensuring reliable and consistent film deposition in rigorous environments. Additionally, it boasts high wear resistance, making it perfect for high-performance thin film coatings. The target’s homogeneous and refined microstructure ensures uniformity during sputtering, facilitating a smooth deposition process.
Related Products: Tantalum Sputtering Target, Ta, Tantalum Aluminum Sputtering Target, Ta/Al, Niobium Sputtering Target, Nb, Lithium Niobate Sputtering Target, LiNbO3
Material Composition: Ta, Nb
Purity: 99.95%
Shape: Planar Disc
Please note that the specifications provided are based on theoretical data. For customized specifications and detailed inquiries, please contact us directly.
Semiconductor Manufacturing: Utilized for depositing thin films in semiconductor devices where high-temperature stability and mechanical strength are essential, especially for high-performance capacitors and resistors.
Aerospace Coatings: Employed in the aerospace industry for coating components such as turbine blades and engine parts, which must endure extreme temperatures and harsh environments due to the high melting point and corrosion resistance of TaNb.
Superconducting Applications: The superconducting properties of niobium make TaNb targets ideal for depositing superconducting films used in MRI machines, quantum computing elements, and superconducting magnets.
High-End Electronics: Used for applying high-quality, durable coatings on advanced electronic devices, including sensors, microelectromechanical systems (MEMS), and other high-performance components that require superior conductivity and durability.
Energy Industry: TaNb targets are utilized in the energy sector for manufacturing components in reactors and energy storage devices, where resistance to high temperatures and corrosion is critical.
Medical Devices: Due to its biocompatibility, TaNb is also used for coating medical implants and devices, enhancing their durability and corrosion resistance in bodily environments.
Our TaNb Targets are meticulously packaged to ensure their integrity during transit. Depending on the size and dimensions, smaller targets are securely placed in polypropylene (PP) boxes, while larger ones are shipped in custom-built wooden crates. We prioritize customized packaging solutions and use appropriate cushioning materials to provide maximum protection during transportation.
Packaging Options:
Q1: What are the primary advantages of using TaNb targets?
A1: TaNb targets offer exceptional thermal stability, high mechanical strength, and superconducting properties, making them ideal for thin film deposition in high-performance semiconductor, aerospace, and energy applications.
Q2: Can the size or shape of the TaNb target be customized?
A2: Yes, Stanford Advanced Materials provides customized TaNb targets in various sizes and shapes to meet specific application requirements. Please contact us for tailored options.
Q3: Which sputtering methods are compatible with TaNb targets?
A3: TaNb targets are compatible with both DC and RF sputtering methods and are suitable for high-power sputtering systems, ensuring consistent and high-quality deposition for thin film applications.
Property | TaNb Target | Tantalum (Ta) Target | Niobium (Nb) Target |
---|---|---|---|
Material Composition | Tantalum Niobium Alloy | Pure Tantalum | Pure Niobium |
Applications | Thin Films, Coatings | Electronics, Alloys | Electronics, Alloys |
Melting Point | ~2,950°C | ~2,996°C | ~2,468°C |
Density (g/cm³) | ~16.5 | 16.6 | 8.57 |
Conductivity | Low | Low | High |
Cost | High | High | Moderate |
Hardness | High | High | Moderate |
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