ST6586 Tantalum Tungsten Target (TaW Target)

Overview of Tantalum Tungsten Target (TaW Target)

The TaW Target is a robust composite sputtering material that merges the outstanding corrosion resistance of tantalum with the high melting point and excellent thermal conductivity of tungsten. This alloy offers remarkable mechanical strength and stability, making it ideal for sputtering processes that operate under extreme conditions. Tantalum ensures resistance to chemical degradation, especially in acidic and high-temperature settings, while tungsten enhances the target’s ability to endure heat and mechanical stress. The synergy of these metals results in a highly durable target, ideal for demanding thin film deposition tasks. The TaW Target maintains uniformity and consistency during sputtering, ensuring high-quality film deposition with minimal particle contamination. It is widely utilized in sectors such as aerospace, electronics, and energy, where performance and longevity are paramount.

Related Products: Tantalum Sputtering Target, Ta, Tantalum Aluminum Sputtering Target, Ta/Al, Tungsten Sputtering Target, W, Nickel Tungsten Sputtering Target, Ni/W

Specifications of Tantalum Tungsten Target (TaW Target)

Material Composition: Ta, W
Purity: 99.95%
Shape: Planar Disc

Please note that the specifications provided are based on theoretical data. For customized specifications and detailed inquiries, please contact us directly.

Custom Dimensions

• Diameter: Tailored to specific requirements
• Thickness: Adjustable based on application needs

Applications of Tantalum Tungsten Target (TaW Target)

• Semiconductor Fabrication: Utilized for depositing thin films in semiconductor devices, particularly for creating durable barrier layers and conductive coatings that require high corrosion resistance and thermal stability.

• Aerospace and Defense: Employed in coating aerospace components such as turbine blades and engine parts, where high-temperature resistance and mechanical strength are critical.

• Energy Sector: Applied in the energy industry for coating high-performance components in nuclear reactors and other extreme environments, providing excellent corrosion resistance and durability.

• Optical Coatings: Used in the deposition of thin films for optical applications that demand durable and high-performance materials.

• Advanced Electronics: Ideal for producing thin films in microelectronics and advanced electronic devices, offering conductive layers with superior durability and resistance to wear and high temperatures.

Packaging Options for Tantalum Tungsten Target (TaW Target)

Our TaW Targets are carefully packaged to ensure their integrity during shipping. Depending on the size and dimensions, smaller targets are securely placed in polypropylene (PP) boxes, while larger ones are shipped in custom-built wooden crates. We prioritize customized packaging solutions and use appropriate cushioning materials to provide maximum protection during transit.

Packaging Options:

• Carton
• Wooden Crate
• Custom Packaging

Manufacturing Process Overview

Testing Methods

1. Chemical Composition Analysis: Utilizes techniques such as Glow Discharge Mass Spectrometry (GDMS) or X-Ray Fluorescence (XRF) to verify purity and composition.
2. Mechanical Properties Testing: Evaluates tensile strength, yield strength, and elongation to assess material performance.
3. Dimensional Inspection: Measures thickness, width, and length to ensure compliance with specified tolerances.
4. Surface Quality Inspection: Identifies defects like scratches, cracks, or inclusions through visual and ultrasonic examinations.
5. Hardness Testing: Determines material hardness to confirm uniformity and mechanical reliability.

Frequently Asked Questions about Tantalum Tungsten Target (TaW Target)

Q1: What are the primary advantages of using TaW targets?
A1: TaW targets offer exceptional high-temperature stability, excellent corrosion resistance, and strong mechanical properties, making them ideal for demanding environments such as aerospace, semiconductor manufacturing, and energy applications.

Q2: Can the size or shape of the TaW target be customized?
A2: Yes, Stanford Advanced Materials provides customized TaW targets in various sizes and shapes to meet specific application requirements. Please contact us for tailored options.

Q3: Which sputtering methods are compatible with TaW targets?
A3: TaW targets are compatible with both DC and RF sputtering methods and are suitable for high-power sputtering systems, ensuring consistent and high-quality deposition for thin film applications.

Performance Comparison: TaW Target vs. Ta Target vs. Nb Target

Additional Information

Raw Materials – Tantalum (Ta)

Physical Properties:

• Density: 16.6 g/cm³
• Melting Point: 3,017°C
• Structure: Body-Centered Cubic (BCC)
• Magnetic: Non-magnetic

Chemical Properties:

• Tantalum is a dense, corrosion-resistant refractory metal with exceptional resistance to acids and forms a protective oxide layer.
• It is highly ductile, biocompatible, and maintains strength at elevated temperatures, making it ideal for electronics, aerospace, and medical applications.
• Tantalum’s excellent capacitance properties make it a key material in capacitor production.

Industrial Applications:

• Superconductors: Essential for creating superconducting magnets and electronic components.
• Aerospace Alloys: Enhances strength and durability in aerospace components.
• Medical Devices: Used in implants and medical instruments due to its biocompatibility.

Raw Materials – Tungsten (W)

Physical Properties:

• Density: 19.3 g/cm³
• Melting Point: 3,422°C
• Structure: Body-Centered Cubic (BCC)
• Magnetic: Non-magnetic

Chemical Properties:

• Tungsten is one of the heaviest and most heat-resistant metals, known for its outstanding hardness and high density.
• It exhibits remarkable resistance to thermal and mechanical fatigue, making it ideal for applications requiring extreme durability.
• Tungsten is chemically stable and forms stable compounds, contributing to its use in various high-performance materials.

Industrial Applications:

• Cutting Tools: Widely used in manufacturing cutting tools due to its hardness and wear resistance.
• High-Temperature Furnaces: Employed in furnace components that operate at extreme temperatures.
• Sputtering Targets: Used in sputtering processes for depositing hard, wear-resistant coatings.
• Radiation Shielding: Utilized in shielding materials due to its high density and structural stability.