| Chemical Composition | Fe, Si |
| Purity | 99.95% |
| Shape | Planar Disc |
The FeSi Target is a specialized alloy tailored for sputtering applications, renowned for its balanced magnetic, mechanical, and thermal properties. Composed primarily of iron with a controlled silicon content, typically ranging from 6-10%, this alloy exhibits increased electrical resistivity and diminished eddy current losses compared to pure iron, which is advantageous during deposition processes. The addition of silicon enhances corrosion resistance and oxidation stability, ensuring the target’s durability in reactive sputtering environments.
The material maintains a fine-grained, homogeneous microstructure, achieved through vacuum melting and precision forming techniques, ensuring consistent film composition and reliable sputtering performance. With a high melting point and low coercivity, FeSi also offers moderate hardness and excellent thermal conductivity, allowing for stable operation under elevated temperatures. Its high magnetic saturation, combined with reduced core losses due to silicon incorporation, makes the target dependable for processes requiring precise control of magnetic and electrical film properties. The target is typically manufactured to high density (>99%) with a smooth surface finish, facilitating uniform thin film deposition and extended service life in demanding PVD systems.
Related Products: Iron Sputtering Target, Fe, Iron Chromium Sputtering Target, Fe/Cr, N-type Silicon Sputtering Target (N-doped Si), Aluminum Silicon Sputtering Target, Al/Si
Melting Point: 1212-1630 °C
Chemical Composition: Fe, Si
Purity: 99.95%
Shape: Planar Disc
Note: Specifications are based on theoretical data. For customized requirements and detailed information, please contact us.
Magnetic Thin Films: Ideal for producing soft magnetic films used in magnetic sensors, transformer cores, and magnetic shielding layers, owing to its low core loss, high magnetic permeability, and reduced coercivity.
Power Electronics: Utilized in sputtering processes for components in high-frequency and high-efficiency power devices where minimized eddy current losses and thermal stability are crucial.
Microelectromechanical Systems (MEMS): Applied in MEMS devices for actuation or sensing applications requiring precise magnetic behavior and uniform thin film structures.
Semiconductor Devices: Employed in advanced packaging and manufacturing of semiconductor devices for magnetic interconnects, shielding layers, or diffusion barriers.
Thin Film Coils and Inductors: Used in RF integrated circuits and miniaturized power supplies to fabricate compact and efficient inductive elements.
Data Storage Technologies: Enhances performance in recording heads and magnetic storage components, where controlled magnetic anisotropy and thermal stability are necessary.
Our FeSi Targets are packaged based on their size and dimensions. Smaller targets are securely packed in polypropylene (PP) boxes, whereas larger targets are placed in custom wooden crates. We prioritize tailored packaging solutions using appropriate cushioning materials to ensure maximum protection during transit.
Packaging Options:
Q1: What is an Iron Silicon Target?
A1: An Iron Silicon Target is a composite material used in sputtering deposition processes to create thin films of iron-silicon alloys on substrates. It is commonly utilized in applications requiring magnetic properties, electrical conductivity, and corrosion resistance.
Q2: What are the key properties of Iron Silicon Targets?
A2: Iron Silicon Targets offer high magnetic permeability, excellent electrical conductivity, corrosion resistance, and high thermal stability, making them ideal for use in magnetic materials, semiconductor devices, and industrial applications.
Q3: What are the main applications of Iron Silicon Targets?
A3: Iron Silicon Targets are used in the magnetic materials industry (e.g., data storage, transformers), semiconductor devices (e.g., thin films for diodes and solar cells), optical coatings, automotive components, and catalyst production, among others.
| Property | FeSi Target | Fe Target | FeCrMo Target |
|---|---|---|---|
| Composition | Fe + Si | Pure Fe | Fe + Cr + Mo |
| Magnetic Properties | Magnetic | Magnetic | Magnetic |
| Corrosion Resistance | Good | Moderate | Excellent |
| Thermal Stability | Moderate | Moderate | High |
| Wear Resistance | Moderate | Moderate | Excellent |
| Electrical Conductivity | Good | Moderate | Good |
| Density | ~7.6 – 7.8 g/cm³ | ~7.87 g/cm³ | ~7.8 – 8.2 g/cm³ |
| Melting Point | ~1,150°C – 1,200°C | ~1,538°C | ~1,500°C – 1,600°C |
| Applications | Magnetic films, coatings | Electrical components, coatings | Aerospace, automotive, tools |
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