Chemical Composition | Co, Cr, W |
Purity | 99.95% |
Shape | Planar Disc |
The CoCrW Target is a robust, high-performance alloy designed for sputtering applications, distinguished by its excellent mechanical strength, thermal stability, and remarkable resistance to corrosion and wear. The cobalt component serves as a durable and flexible base, enhancing the alloy’s ductility and ability to withstand high temperatures. Chromium contributes by forming a protective oxide layer, ensuring the material remains resistant to harsh chemical environments and oxidation. Tungsten, known for its high melting point and exceptional hardness, reinforces the alloy’s structural integrity, allowing it to endure extreme thermal and mechanical stresses without degradation.
This combination results in a stable, homogeneous microstructure with fine grains, typically achieved through advanced manufacturing processes like vacuum arc melting or hot isostatic pressing. The alloy boasts a broad melting range, low porosity, and compatible thermal expansion properties, making it ideal for challenging thin film deposition processes. Additionally, its moderate electrical conductivity ensures consistent sputtering performance, while its durable nature guarantees dimensional stability and long-lasting target performance during extended sputtering operations.
Related Products: Cobalt Sputtering Target, Co, Chromium Cobalt Sputtering Target, Cr/Co, Chromium Sputtering Target, Cr, Chromium Nickel Sputtering Target, Cr/Ni, Tungsten Sputtering Target, W, Cobalt Tungsten Sputtering Target, Co/W
Chemical Composition: Co, Cr, W
Purity: 99.95%
Shape: Planar Disc
Note: The specifications provided are based on theoretical data. For tailored requirements and detailed information, please reach out to us directly.
Available in customized dimensions to meet your specific needs.
Aerospace and Turbine Components: CoCrW thin films are utilized to coat parts such as jet engines, turbine blades, and combustion chamber components, offering excellent resistance to high-temperature oxidation, thermal fatigue, and erosion.
Biomedical Devices: Due to the biocompatibility of cobalt and chromium combined with tungsten’s wear resistance, CoCrW coatings enhance the durability and reduce wear particles in orthopedic and dental implants.
Industrial Tooling and Cutting Equipment: Ideal for depositing hard coatings on cutting tools, forming dies, and wear-resistant parts. These coatings extend tool life by increasing hardness, reducing friction, and preventing high-temperature deformation.
Chemical Processing Equipment: In environments exposed to corrosive chemicals, CoCrW films act as protective barriers on reactors, valves, and pump components, safeguarding against acid and alkali corrosion, especially at elevated temperatures.
Electronics and MEMS: For microelectromechanical systems (MEMS) and advanced electronic devices, CoCrW coatings provide the necessary mechanical strength, dimensional stability, and oxidation resistance, ensuring the longevity of micro-scale structures.
Our CoCrW Targets are packaged according to the size and dimensions of the material. Smaller targets are securely placed in polypropylene (PP) boxes, while larger ones are housed in custom-built wooden crates. We emphasize customized packaging solutions and utilize appropriate cushioning materials to ensure optimal protection during transit.
Packaging Options:
Q1: What is the density and purity level of the CoCrW Target?
A1: Our CoCrW Targets are manufactured with a density greater than 99% and high material purity, typically ≥99.9%, ensuring uniform sputtering rates and consistent thin film quality.
Q2: Can CoCrW Targets be used in both RF and DC sputtering systems?
A2: Yes, CoCrW Targets are compatible with both RF and DC magnetron sputtering systems, depending on your deposition setup and film requirements.
Q3: Are different sizes and shapes available?
A3: Absolutely. We offer CoCrW Targets in various dimensions, including planar and rotary configurations, with customizable diameters, thicknesses, and bonding options.
Specification | CoCrMo Target | Titanium Target | CoCrW Target |
---|---|---|---|
Composition | Co, Cr, Mo | Ti | Co, Cr, W |
Hardness | High hardness and wear resistance | Moderate hardness | Very high hardness, excellent wear resistance |
Corrosion Resistance | Excellent | Excellent | Excellent |
Thermal Stability | High thermal stability | High thermal stability | Extremely high thermal stability |
Wear Resistance | Superior wear resistance | Moderate wear resistance | Excellent wear resistance |
Biocompatibility | Highly biocompatible | Highly biocompatible | Good biocompatibility |
Electrical Conductivity | Low | Low | Low |
Applications | Medical implants, prosthetics, aerospace components, dental implants | Aerospace, medical devices (e.g., implants), electronics | Aerospace, high-temperature industrial applications, cutting tools, medical devices |
Density | 8.3-8.6 g/cm³ | ~4.5 g/cm³ | ~9.0 g/cm³ |
Melting Point | 1,300°C to 1,400°C | ~1,668°C | ~3422°C |
Typical Purity | 99.5% or higher | 99.9% or higher | 99.9% or higher |
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Tungsten (W) is a refractory metal renowned for its extremely high melting point, exceptional mechanical strength, and resistance to thermal and chemical degradation. With an atomic number of 74, tungsten belongs to the transition metal group on the periodic table. It holds the highest melting point of all metals at 3422 °C and a boiling point of approximately 5555 °C, making it perfect for applications that involve extreme temperatures. Tungsten is dense (19.25 g/cm³), hard, and offers excellent thermal and electrical conductivity. Chemically, tungsten is relatively inert, resisting oxidation at room temperature and maintaining stability in a variety of corrosive environments. Its strength and low vapor pressure at high temperatures make it indispensable in aerospace, electronics, and high-performance alloying applications. In thin film and sputtering target uses, tungsten enhances film hardness, thermal stability, and wear resistance.