Chemical Composition | Ni, Cr, Fe |
Purity | 99.9% |
Shape | Planar Disc |
The Nickel Chromium Iron (NiCrFe) Target is a durable alloy sputtering material renowned for its superior thermal stability, oxidation resistance, and mechanical robustness. The synergistic combination of nickel, chromium, and iron results in a chemically stable matrix that withstands high-temperature degradation and corrosion, making it ideal for challenging deposition environments. Nickel contributes to structural integrity and ductility, chromium imparts strong oxidation and corrosion resistance, while iron enhances mechanical strength and magnetic properties. This alloy ensures excellent adhesion and uniformity during sputtering and possesses thermal expansion properties compatible with a variety of substrates. NiCrFe targets are perfect for creating durable and stable thin films in applications that demand performance under thermal cycling, harsh atmospheres, or mechanical stress.
Related Products: Nickel Sputtering Target, Ni, Nickel Cobalt Sputtering Target, Ni-Co, Chromium Sputtering Target, Cr, Chromium Nickel Sputtering Target, Cr/Ni, Iron Sputtering Target, Fe, Iron Chromium Sputtering Target, Fe/Cr
Note: The specifications above are based on theoretical data. For custom requirements and detailed inquiries, please contact us.
Our NiCrFe Targets are packaged in customized cartons tailored to the size of the material. Smaller targets are securely placed in polypropylene (PP) boxes, while larger ones are housed in specially designed wooden crates. We ensure precise packaging customization and use appropriate cushioning materials to provide maximum protection during transit.
Yes, we offer fully customizable planar targets in various diameters, thicknesses, and geometries to meet specific sputtering system requirements.
NiCrFe targets provide excellent thermal and chemical stability, high mechanical strength, and reliable resistivity control, making them ideal for thin film resistor fabrication and coatings in harsh environments.
Absolutely, NiCrFe targets are compatible with both DC and RF sputtering systems, depending on the film requirements and deposition setup.
Performance Parameters | NiCrFe Target | Pure Nickel (Ni) | NiCr 80/20 Alloy | Stainless Steel 304 |
---|---|---|---|---|
Composition | Ni:Cr:Fe = 70:20:10, ≥99.9% | Ni ≥99.9% | Ni:Cr = 80:20 | Fe:Cr:Ni = 70:19:11 |
Density (g/cm³) | 8.2-8.5 | 8.90 | 8.4-8.6 | 7.9-8.0 |
Thermal Conductivity (W/m·K) | 12-15 | 90 | 11-14 | 15-17 |
Electrical Resistivity (μΩ·cm) | 110-130 | 6.9 | 108-115 | 72-90 |
Melting Point (°C) | 1400-1450 | 1455 | 1400-1420 | 1400-1450 |
Oxidation Resistance | Excellent (≤1000°C) | Poor (oxidizes above 400°C) | Good (≤1200°C) | Moderate (≤800°C) |
Corrosion Resistance | High (acid/alkali resistance) | Low (prone to corrosion) | Moderate | High (passive Cr layer) |
Mechanical Strength | High (tensile ≥500 MPa) | Low (ductile) | Moderate (≥400 MPa) | High (≥520 MPa) |
Key Applications | Resistive films, heating elements, aerospace coatings | Conductive layers, EMI shielding | Heating coils, thermocouples | Structural parts, chemical reactors |
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