Chemical Composition | Ni, Cu, Ti |
Purity | 99.95%, 99.99% |
Shape | Planar Disc |
The Nickel Copper Titanium (NiCuTi) Sputtering Target is a meticulously crafted alloy produced through vacuum arc melting and hot isostatic pressing (HIP). Key features include:
Combining nickel (melting point: 1455°C) for thermal stability and corrosion resistance, copper (thermal conductivity: 401 W/m·K) for enhanced electrical conductivity and efficient heat dissipation, and titanium (density: 4.51 g/cm³) for lightweight yet robust mechanical properties. This blend results in high hardness (Vickers hardness ≥200 HV), low resistivity (≤10 μΩ·cm), and impressive fatigue resistance.
Achieving purity levels of ≥99.95%, with trace impurities such as Fe, C, and O maintained below 50 ppm. Advanced manufacturing processes ensure a fine-grain structure (≤15 µm), minimal porosity (<0.2%), and a smooth surface finish (Ra <0.8 µm after CMP polishing) for uniform sputtering performance.
Titanium’s natural oxide layer (TiO₂) and nickel’s passivation contribute to stability in high-temperature (up to 800°C), acidic, or humid environments, making it suitable for long-term high-power sputtering applications.
Related Products: Nickel Sputtering Target, Ni, Nickel Cobalt Sputtering Target, Ni-Co, Copper Sputtering Target, Cu, Titanium Sputtering Target, Ti, Titanium Dioxide Sputtering Target, TiO2
Note: Specifications are based on theoretical data. For customized requirements and detailed information, please contact us.
Customization is available based on specific drawings.
Our NiCuTi Targets are packaged in specially designed cartons of varying sizes based on the dimensions of the material. Smaller targets are securely contained within polypropylene (PP) boxes, while larger ones are shipped in custom wooden crates. We prioritize precise packaging customization and employ suitable cushioning materials to ensure optimal protection during transit.
A Nickel Copper Titanium Target is a composite material used in sputtering deposition processes to create thin films composed of nickel, copper, and titanium alloys. It is widely utilized across various industries, including electronics, automotive, and coatings, where specific alloy compositions are necessary for enhanced performance.
These targets combine the strength, corrosion resistance, and thermal stability of nickel, copper, and titanium, making them ideal for producing durable and high-performance thin films with tailored electrical, mechanical, and thermal characteristics.
NiCuTi Targets are extensively used in electronics, catalyst production, sensors, automotive coatings, and aerospace components. Their unique alloy composition offers superior conductivity, wear resistance, and durability in demanding environments.
Performance Parameters | NiCuTi Target | Pure Copper (Cu) | Nickel-Titanium Alloy (NiTi) | Nickel-Copper Alloy (NiCu) |
---|---|---|---|---|
Composition & Purity | Ni:Cu:Ti = 50:30:20, ≥99.95% | ≥99.99% (5N) | Ni:Ti = 55:45, ≥99.9% | Ni:Cu = 80:20, ≥99.95% |
Density (g/cm³) | 7.2-8.5 | 8.96 | 6.4-6.5 | 8.9 |
Thermal Conductivity (W/m·K) | 60-90 | 401 | 10-20 | 50-70 |
Electrical Resistivity (μΩ·cm) | 8-12 | 1.68 | 80-100 | 5-8 |
Vickers Hardness (HV) | 180-250 | 40-60 | 200-300 | 120-180 |
Corrosion Resistance | High (TiO₂ layer + Ni) | Low (prone to oxidation) | Moderate (Ti passive layer) | Moderate (Ni-based) |
Melting Point (°C) | 1200-1350 (variable) | 1085 | 1300-1350 | 1455 (Ni-dominant) |
Cost (per unit mass) | High (complex alloying) | Low | Very High (Ti cost) | Moderate |
Key Applications | Semiconductor interconnects, aerospace coatings, biomedical films | Conductive layers, heat sinks | Shape-memory devices, medical implants | Corrosion-resistant industrial parts |
Basic Properties
Chemical Properties
Applications
Resources and Production
Atomic Properties
Physical Properties
Chemical Properties
Key Applications
Atomic Properties
Physical Properties
Chemical Properties
Key Applications