Element Symbol | Ni, Pt |
Purity | 99.9%, 99.95% |
Shape | Planar Disc |
Nickel-Platinum sputtering targets (NiPt Targets) are engineered for high-performance applications by precisely alloying nickel (Ni) with platinum (Pt) in predetermined ratios (e.g., Ni:Pt = 80:20 or other customized proportions). Key attributes include:
Related Products: Nickel Sputtering Target, Ni, Platinum Sputtering Target, Pt, Nickel Cobalt Sputtering Target, Ni-Co, Platinum Iridium Sputtering Target, Pt-Ir
Note: Specifications are based on theoretical data. For customized requirements and detailed information, please contact us.
Our Nickel Platinum Targets are packaged in tailored cartons of varying sizes based on material dimensions. Smaller items are securely housed in polypropylene (PP) boxes, whereas larger targets are shipped in custom wooden crates. We ensure precise packaging customization and the use of appropriate cushioning materials to guarantee optimal protection during transit.
A1: NiPt targets are dense, highly corrosion-resistant, and exhibit excellent thermal stability. They feature a fine-grain structure and smooth surfaces, ensuring uniform sputtering performance.
A2: These targets are primarily used in physical vapor deposition (PVD) methods, including direct current (DC) and radio frequency (RF) magnetron sputtering.
A3: It is recommended to store NiPt targets in a clean, dry environment, preferably in vacuum-sealed packaging to prevent contamination and oxidation.
Property | NiPt Target | Pure Pt Target | Pure Ni Target | PtCo Target |
---|---|---|---|---|
Purity | ≥99.9% (3N+) | ≥99.99% (4N+) | ≥99.9% (3N+) | ≥99.95% (4N) |
Crystallinity | Uniform FCC structure | Single-phase FCC | Single-phase FCC | FCC with Co segregation risks |
Thermal Stability | Excellent (high melting point alloy) | Moderate (Pt sinters at high temperatures) | Good (oxidizes above 300°C) | Poor (Co migration at high temperatures) |
Corrosion Resistance | Outstanding (Ni-Pt synergy) | Excellent (noble metal) | Moderate (prone to oxidation) | Good (Co reduces Pt inertness) |
Surface Finish | Mirror-like (Ra <0.1 μm) | Mirror-like (Ra <0.05 μm) | Matte (Ra ~0.5 μm) | Smooth (Ra <0.2 μm) |
Grain Size Control | Ultra-fine (≤50 nm) | Fine (≤100 nm) | Coarse (≥200 nm) | Moderate (≤150 nm) |
Sputtering Rate | High (balanced Ni/Pt sputter yield) | Low (due to high Pt density) | Very high (low density) | Moderate (Co lowers efficiency) |
Cost Efficiency | High (reduced Pt content) | Very low (high Pt cost) | Very high (low Ni cost) | Moderate (Co lowers Pt usage) |
Key Applications | Nuclear systems, X-ray windows, aerospace coatings | ICs, conductive layers | Biomedical coatings, corrosion-resistant layers |
Basic Properties
Chemical Properties
Applications
Resources and Production
Basic Properties
Chemical Properties
Applications
Resources and Production