(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA
(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA

ST6553 Erbium Planar Target

Material Er
CAS Number 7440-52-0
Size Customized
Density 8.795 g/cm3
Purity 99.9%



Description

Erbium Planar Target Overview

Stanford Advanced Materials (SAM) provides high-purity Erbium Planar Targets, composed of erbium metal with purity levels ranging from 99.9% to 99.99% (3N-4N), specifically designed for high-performance thin-film deposition applications. These targets come in standard sizes from 50 mm to 200 mm in diameter, with thicknesses between 3 mm and 10 mm, and can be customized with bonded backplates (such as Cu or Mo) for enhanced thermal stability, particularly in high-power sputtering systems. With a fine-grain microstructure (<50 µm) and a density greater than 95% of the theoretical value, SAM ensures minimal particle emission and excellent uniformity of the deposited films. To prevent oxidation, all targets are packaged in a vacuum-sealed, argon-filled environment with desiccants, preserving surface quality during storage and shipping. Our rigorous quality control includes ICP-MS impurity analysis, XRD crystallographic testing, and surface roughness measurements (<0.5 µm Ra), all in line with ASTM F3091 and ISO 9001 standards. SAM also provides technical support on sputtering parameters (such as RF power optimization and argon gas pressure ranges) and guarantees delivery within 3-4 weeks for standard orders.

Erbium Planar Target Features

  • Purity: 99.9%
  • Density: 8.795 g/cm³
  • Melting Point: 1522°C
  • Boiling Point: 2510°C
  • Shape: Rectangular or customizable
  • Size: Custom sizes available
    Note: Product information is based on theoretical data. For specific needs, please contact us directly.

Applications of Erbium Planar Targets

  1. Fiber Optics & Telecommunications: Essential for erbium-doped films in optical amplifiers (EDFAs) used in long-distance fiber-optic communication.
  2. Infrared Laser Systems: Er:YAG lasers (2.94 µm wavelength) applied in medical dermatology, dentistry, and precision material processing.
  3. Nuclear Engineering: Utilized in neutron-absorbing coatings for reactor control rods and radiation shielding, particularly with erbium-166.
  4. Medical & Biomedical Devices: Erbium-based thin films for biosensors and radioisotope therapy, such as Er-169 in pain relief treatment for bone cancer.
  5. Quantum Research: Er³⁺-doped crystals for quantum memory applications and photonic quantum computing.

Packaging SAM offers a variety of packaging options based on the product size. Smaller targets are securely packed in PP boxes, while larger ones are shipped in custom wooden crates, all designed to ensure maximum protection during transport.

Manufacturing Process

1. Production Steps:

2. Quality Testing:

  • Chemical Composition: Verified via GDMS or XRF.
  • Mechanical Testing: Includes tensile strength, yield strength, and elongation tests.
  • Dimensional Inspection: Ensures compliance with specifications.
  • Surface Quality: Visual and ultrasonic checks for defects.
  • Hardness: Uniformity and mechanical reliability verified.

Frequently Asked Questions (FAQs)

  1. What purity grades do you offer? SAM offers 99.9% purity (3N).
  2. Can I request custom target shapes? Yes, we provide custom diameters, thicknesses, and bonded configurations (such as Ag backplates).
  3. How can I prevent oxidation of erbium during use? Store targets in dry argon environments and perform pre-sputtering cleaning of surfaces.

Comparison with Competitor Products

Feature Erbium Rotary Target Erbium Planar Target
Material Utilization 80-90% 30-40%
Service Life Longer Shorter
Coating Uniformity More uniform Variability in thickness
Production Cost Higher initial cost Lower initial cost
Applications Large-area coatings Small-area coatings
Sputtering Stability Higher Potentially lower
Compatible Equipment Rotary sputtering systems Planar sputtering systems