Chemical Formula | BaxSr(1-x)TiO3 |
Catalog No. | ST1013 |
CAS Number | 12430-73-8 |
Purity | 99.9%, 99.95%, 99.99%, 99.995%, 99.999% |
Shape | Discs, Plates, Column Targets, Step Targets, Custom-made |
Barium Strontium Titanate Sputtering Target provided by Stanford Advanced Materials is utilized in thin film deposition processes, enabling the fabrication of advanced electronic devices with tunable dielectric properties for applications in telecommunications and electronics.
Barium Strontium Titanate Sputtering Target exhibits exceptional properties essential for thin film deposition processes. Composed of barium, strontium, and titanium oxides, it offers tunable dielectric properties, critical for applications in electronics and telecommunications. With its high purity and precise composition, this target ensures uniform film deposition, enabling the fabrication of advanced electronic devices such as tunable capacitors and microwave devices. Barium Strontium Titanate Sputtering Target‘s versatility and reliability make it indispensable in the semiconductor industry, contributing to the development of next-generation electronic components with enhanced performance and functionality.
Related Product: Barium Zirconate Sputtering Target
Compound Formula | BaxSr(1-x)TiO3 |
Molecular Weight | 336.81 |
Appearance | Brown Target |
Melting Point | 1625°C |
Density | ~6 g/cm³ |
Available Sizes | Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″ |
Our Barium Strontium Titanate Sputtering Target is carefully handled during storage and transportation to preserve the quality of our products in their original condition.