ST1012 Barium Carbonate Sputtering Target, BaCO3

Barium Carbonate Sputtering Target Description

Barium Carbonate Sputtering Target is a high-purity material used in thin film deposition processes for applications in semiconductor and optical coating industries. This target exhibits excellent thermal and chemical stability, ensuring uniform and precise film deposition. With its high density and purity, it enables efficient sputtering processes, resulting in high-quality thin films with desired properties. Barium Carbonate Sputtering Target is tailored to meet stringent requirements, offering reliable performance and consistency. Its versatile nature makes it suitable for a wide range of applications, including optical coatings, electronic devices, and solar cells, contributing to advancements in technology and materials science.

Related Product: Barium Bismuth Oxide Sputtering Target, Barium Zirconate Sputtering Target

Barium Carbonate Sputtering Target Specifications

Barium Carbonate Sputtering Target Handling Notes

1. Indium bonding is recommended for the Barium Carbonate Sputtering Target, due to some of its characteristics not amenable to sputtering like brittleness, low thermal conductivity, etc.
2. This material has a low thermal conductivity and is susceptible to thermal shock.

Barium Carbonate Sputtering Target Application

1. Semiconductor Industry: Used for the fabrication of integrated circuits, microchips, and other electronic devices where precise thin film coatings are required.
2. Optical Coating Industry: Employed in the production of optical coatings for lenses, mirrors, and other optical components used in cameras, telescopes, and lasers.
3. Solar Cell Manufacturing: Utilized in the deposition of thin film layers in photovoltaic cells to enhance light absorption and energy conversion efficiency.
4. Display Technology: Used in the production of flat-panel displays such as LCDs (liquid crystal displays) and OLEDs (organic light-emitting diodes) to create high-quality, uniform thin film layers.

Barium Carbonate Sputtering Target Packaging

Our Barium Carbonate Sputtering Target is carefully handled during storage and transportation to preserve the quality of our products in their original condition.

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SAM’s Barium Carbonate Sputtering Target is available in various forms, purities, and sizes. We specialize in producing high-purity physical vapour deposition (PVD) materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapour deposition (CVD), and physical vapour deposition (PVD) display and optical applications.