Chemical Formula | ZnO-SnO2 |
Catalog No. | ST1008 |
CAS Number | 12036-37-2 |
Purity | 99.9%, 99.95%, 99.99%, 99.995%, 99.999% |
Shape | Discs, Plates, Column Targets, Step Targets, Custom-made |
Known for exceptional purity, Stanford Advanced Materials (SAM) offers Zinc Tin Oxide Sputtering Targets. Leveraging extensive expertise in materials science, SAM is committed to delivering tailored solutions and competitive pricing, precisely meeting the demands of nanotechnology and thin-film deposition applications.
Zinc Tin Oxide (ZTO) Sputtering Target is a compound material widely used in thin film deposition processes. Composed of zinc oxide and tin oxide, ZTO exhibits excellent electrical conductivity and optical transparency, making it ideal for applications in transparent conductive films, such as touchscreens, solar cells, and displays. Its unique properties include high electron mobility, good stability, and compatibility with various substrates. ZTO Sputtering Targets offer precise control over film thickness and composition, enabling the production of high-performance electronic devices with enhanced functionality and durability.
Related Product: Zinc Sputtering Target, Tin Zinc Sputtering Target
Compound Formula | ZnO-SnO2 |
Molecular Weight | 232.087 |
Appearance | White Target |
Melting Point (℃) | >570 |
Density g/cm3 | 4.25 |
Available Sizes | Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″ |
Our Zinc Tin Oxide (ZTO) Sputtering Target is carefully handled during storage and transportation to preserve the quality of our products in their original condition.
SAM’s Zinc Tin Oxide (ZTO) Sputtering Target is available in various forms, purities, and sizes. We specialize in producing high-purity physical vapour deposition (PVD) materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapour deposition (CVD), and physical vapour deposition (PVD) display and optical applications.