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(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA

ST1006 Yttria Stabilized Zirconia (YSZ) Sputtering Target, Y2O3/ZrO2

Chemical Formula Y2O3/ZrO2
Catalog No. ST1006
CAS Number
Purity 99.9%, 99.95%, 99.99%, 99.995%, 99.999%
Shape Discs, Plates, Column Targets, Step Targets, Custom-made

Known for exceptional purity, Stanford Advanced Materials (SAM) offers Yttria Stabilized Zirconia Sputtering Targets. Leveraging extensive expertise in materials science, SAM is committed to delivering tailored solutions and competitive pricing, precisely meeting the demands of nanotechnology and thin-film deposition applications.




Description

Yttria Stabilized Zirconia (YSZ) Sputtering Target Description

Yttria Stabilized Zirconia (YSZ) Sputtering Target is a material used in the sputtering deposition process. Sputtering is a widely used technique in thin film deposition, where atoms or ions are ejected from a solid target material and deposited onto a substrate to form a thin film.

YSZ is a solid solution of zirconia and yttria, where the yttria acts as a stabilizer for the zirconia crystal structure. The addition of yttria stabilizes the high-temperature cubic phase of zirconia at room temperature, allowing it to retain its desirable properties. YSZ is known for its high ionic conductivity, thermal stability, and resistance to chemical corrosion. These properties make it suitable for applications such as solid oxide fuel cells, electrolyte membranes, oxygen sensors, and protective coatings.

Related Product: Yttrium Oxide Sputtering Target, Yttrium Fluoride Sputtering Target

Yttria Stabilized Zirconia (YSZ) Sputtering Target Specifications

Compound Formula Y2O3/ZrO2
Molecular Weight 347.69
Appearance White Target
Melting Point >2600℃
Available Sizes Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″

Thick: 0.125″, 0.250″

Yttria Stabilized Zirconia (YSZ) Sputtering Target Handling Notes

  1. Indium bonding is recommended for the Yttria Stabilized Zirconia (YSZ) Sputtering Target, due to some of its characteristics not amenable to sputtering like brittleness, low thermal conductivity, etc.
  2. This material has a low thermal conductivity and is susceptible to thermal shock.

Yttria Stabilized Zirconia (YSZ) Sputtering Target Application

  1. Solid Oxide Fuel Cells (SOFC): Due to its superior ionic conductivity, Yttria Stabilized Zirconia Sputtering Target is used to prepare the electrolyte layer in SOFCs to improve cell performance.
  2. Optical coatings: Yttria Stabilized Zirconia’s high melting point and matching coefficient of thermal expansion make it ideal for the preparation of high-temperature optical coatings such as anti-reflective and thermal barrier coatings.
  3. Ceramic Preparation: As a stable ceramic material, Yttria Stabilized Zirconia Sputtering Target is used to prepare high-performance ceramic parts such as zirconia ceramic blades and ceramic bearings.
  4. Thermal Barrier Coatings: Yttria Stabilized Zirconia Sputtering Target can be used to coat high-temperature engine components to provide a thermal barrier effect and extend component life.
  5. Electronics: Suitable for the preparation of high-performance electronic devices such as sensors and capacitors, utilizing their electrical properties and stability.

Yttria Stabilized Zirconia (YSZ) Sputtering Target Packaging

Our Yttria Stabilized Zirconia (YSZ) Sputtering Target is carefully handled during storage and transportation to preserve the quality of our products in their original condition.

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SAM’s Yttria Stabilized Zirconia (YSZ) Sputtering Target is available in various forms, purities, and sizes. We specialize in producing high-purity physical vapour deposition (PVD) materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapour deposition (CVD), and physical vapour deposition (PVD) display and optical applications.