ST1005 Niobium-doped Titanium Dioxide Sputtering Target, TiO2-Nb

Niobium-doped Titanium Dioxide Sputtering Target Description

Niobium-doped Titanium Dioxide Sputtering Targets exhibit superior chemical stability, maintaining their structure and properties under a wide range of environmental conditions. Due to the combination of Titanium Dioxide and Niobium, Niobium-doped Titanium Dioxide Sputtering Targets have a high sputtering efficiency, which contributes to higher deposition rates during thin film preparation. Due to the optical properties of Titanium Dioxide, Niobium-doped Titanium Dioxide Sputtering Targets offer superior performance in optical thin film coating and optoelectronic device preparation. The addition of Niobium improves the electrical properties of the material, giving it better potential for use in the preparation of electronic devices. Niobium-doped Titanium Dioxide Sputtering Targets are suitable for different types of substrates, including glass, silicon, etc., increasing their flexibility in different applications.

Related Product: Titanium Sputtering Target, Aluminum Titanium Sputtering Target

Niobium-doped Titanium Dioxide Sputtering Target Specifications

Niobium-doped Titanium Dioxide Sputtering Target Handling Notes

1. Indium bonding is recommended for the Niobium-doped Titanium Dioxide Sputtering Target, due to some of its characteristics not amenable to sputtering like brittleness, low thermal conductivity, etc.
2. This material has a low thermal conductivity and is susceptible to thermal shock.

Niobium-doped Titanium Dioxide Sputtering Target Application

1. Optical film coating: Niobium-doped Titanium Dioxide Sputtering Targets are suitable for the preparation of high-performance optical films, such as reflective films, transparent conductive films and anti-reflective films.
2. Electronics: Niobium-doped Titanium Dioxide Sputtering Targets offer excellent performance in the preparation of electronic devices, such as optoelectronic devices and sensors, due to the improved electrical properties of niobium additions.
3. Optoelectronics: Due to their superior optical properties, Niobium-doped Titanium Dioxide Sputtering Targets are used in a wide range of applications in the field of optoelectronics, including the preparation of solar cells and optoelectronic devices.
4. Conductive Coatings: Suitable for the preparation of conductive coatings, widely used in electronics, optics and display devices.

Niobium-doped Titanium Dioxide Sputtering Target Packaging

Our Niobium-doped Titanium Dioxide Sputtering Target is carefully handled during storage and transportation to preserve the quality of our products in their original condition.

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SAM’s Niobium-doped Titanium Dioxide Sputtering Target is available in various forms, purities, and sizes. We specialize in producing high-purity physical vapour deposition (PVD) materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapour deposition (CVD), and physical vapour deposition (PVD) display and optical applications.