ST1004 Terbium Iron Cobalt Sputtering Target, Tb-Fe-Co

Terbium Iron Cobalt Sputtering Target Description

Terbium Iron Cobalt Sputtering Target is a material used in the sputtering deposition process. Sputtering is a widely used technique in thin film deposition, where atoms or ions are ejected from a solid target material and deposited onto a substrate to form a thin film.

Terbium Iron Cobalt Sputtering Target is known for its unique magnetic properties and is commonly used in the production of magnetic thin films. TbFeCo thin films have been studied for their potential applications in magnetic storage devices, such as magnetic recording media and magnetic sensors. The resulting thin films can exhibit desirable magnetic characteristics, such as high coercivity and magnetization, which are important for magnetic storage and sensing applications.

Related Product: Aluminum Telluride Sputtering Target, Antimony Telluride Sputtering Target

Terbium Iron Cobalt Sputtering Target Specifications

Terbium Iron Cobalt Sputtering Target Handling Notes

1. Indium bonding is recommended for the Terbium Iron Cobalt Sputtering Target, due to some of its characteristics not amenable to sputtering like brittleness, low thermal conductivity, etc.
2. This material has a low thermal conductivity and is susceptible to thermal shock.

Terbium Iron Cobalt Sputtering Target Application

1. Electronic Manufacturing: Terbium Iron Cobalt Sputtering Targets are vital in electronic manufacturing, contributing to the creation of high-performance electronic devices due to their exceptional purity and unique material composition.
2. Advanced Materials Engineering: These targets find significance in advanced materials engineering, where their distinctive properties make them valuable in the development of innovative materials with enhanced characteristics.
3. Nanotechnology Applications: Terbium Iron Cobalt Sputtering Targets play a crucial role in nanotechnology applications, showcasing adaptability and contributing to advancements in cutting-edge technologies.
4. Thin-Film Deposition: Instrumental in thin-film deposition processes, these targets ensure precise and uniform coatings, serving various industrial and research applications.

Terbium Iron Cobalt Sputtering Target Packaging

Our Terbium Iron Cobalt Sputtering Target is carefully handled during storage and transportation to preserve the quality of our products in their original condition.

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SAM’s Terbium Iron Cobalt Sputtering Target is available in various forms, purities, and sizes. We specialize in producing high-purity physical vapour deposition (PVD) materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapour deposition (CVD), and physical vapour deposition (PVD) display and optical applications.