Chemical Formula | Sn-Ag |
Catalog No. | ST1003 |
CAS Number | – |
Purity | 99.9%, 99.95%, 99.99%, 99.995%, 99.999% |
Shape | Discs, Plates, Column Targets, Step Targets, Custom-made |
Leveraging extensive materials science expertise, Stanford Advanced Materials (SAM) introduces Tin Silver Sputtering Targets, renowned for their outstanding purity. Our dedication involves providing customized solutions and competitive pricing to meet the precise demands of nanotechnology and thin-film deposition, reflecting SAM’s commitment to excellence in materials engineering.
Tin Silver Sputtering Target is a material used in the sputtering deposition process. Sputtering is a widely used technique in thin film deposition, where atoms or ions are ejected from a solid target material and deposited onto a substrate to form a thin film.
Tin Silver Sputtering Target is often used in electronic applications, particularly in the manufacturing of solder alloys. The addition of silver to tin improves the mechanical properties, such as strength and ductility, of the solder, making it suitable for joining electronic components.
Related Product: Tin Zinc Sputtering Target, Tin Sputtering Target
Compound Formula | Sn-Ag |
Molecular Weight | 226.5 |
Appearance | Silver Metallic Target |
Available Sizes | Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″ |
Our Tin Silver Sputtering Target is carefully handled during storage and transportation to preserve the quality of our products in their original condition.
SAM’s Tin Silver Sputtering Target is available in various forms, purities, and sizes. We specialize in producing high-purity physical vapour deposition (PVD) materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapour deposition (CVD), and physical vapour deposition (PVD) display and optical applications.