| Chemical Formula | NiS |
| Catalog No. | ST1000 |
| CAS Number | 16812-54-7 |
| Purity | 99.9%, 99.95%, 99.99%, 99.995%, 99.999% |
| Shape | Discs, Plates, Column Targets, Step Targets, Custom-made |
Embark on a journey into the world of precision with Nickel Sulfide Sputtering Target, offered by Stanford Advanced Materials (SAM). Crafted with meticulous attention, this sputtering target guarantees exceptional quality and performance, making it a superior choice for precise thin film deposition.
Nickel Sulfide Sputtering Targets exhibit distinct properties essential for various applications. Recognized for their high purity, these targets are crucial in precise thin-film deposition processes. The unique composition of Nickel Sulfide imparts desirable electrical conductivity, making it valuable in electronic and semiconductor manufacturing. Additionally, Nickel Sulfide demonstrates excellent thermal stability, enhancing its suitability for applications in high-temperature environments. The material’s optical properties also make it relevant in optical coatings and thin-film technologies. Overall, the combination of purity, electrical conductivity, thermal stability, and optical characteristics makes Nickel Sulfide Sputtering Targets versatile in advancing technology across multiple domains.
Related Product: Aluminum Nickel Sputtering Target, Chromium Nickel Sputtering Target
| Compound Formula | NiS |
| Molecular Weight | 90.75 |
| Appearance | Yellow Target |
| Available Sizes | Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″ |
Nickel Sulfide Sputtering Targets find diverse applications across advanced technologies. Primarily employed in thin-film deposition processes, these targets are integral to electronic and semiconductor manufacturing due to their high purity and desirable electrical conductivity. Nickel Sulfide’s excellent thermal stability makes it suitable for applications in high-temperature environments, contributing to the production of robust electronic components. Furthermore, its optical properties render it valuable in optical coatings and thin-film technologies, extending its utility to various fields such as sensors and optoelectronics. Overall, Nickel Sulfide Sputtering Targets play a crucial role in advancing technology in electronic, optical, and semiconductor applications.
Our Nickel Sulfide Sputtering Target is carefully handled during storage and transportation to preserve the quality of our products in their original condition.
SAM’s Nickel Sulfide Sputtering Target is available in various forms, purities, and sizes. We specialize in producing high purity physical vapour deposition (PVD) materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapour deposition (CVD), and physical vapour deposition (PVD) display and optical applications.
