ST0996 Tungsten Niobium Sputtering Target, W/Nb

Tungsten Niobium Sputtering Target Description

Tungsten Niobium Sputtering Targets are advanced materials used in thin-film deposition processes. Combining the exceptional properties of tungsten and niobium, these targets exhibit high melting points, excellent thermal conductivity, and superior mechanical strength. They are known for their exceptional stability, durability, and resistance to corrosion, making them ideal for applications in semiconductor manufacturing, optical coatings, and aerospace industries. Tungsten Niobium Sputtering Targets enable precise and reliable film deposition, resulting in enhanced device performance, improved optical properties, and increased wear resistance. These targets are essential for achieving high-quality thin films in various cutting-edge technologies.

Related Product: Tungsten Sputtering Target, Cobalt Tungsten Sputtering Target

Tungsten Niobium Sputtering Target Specifications

Tungsten Niobium Sputtering Target Handling Notes

1. Indium bonding is recommended for the Tungsten Niobium Sputtering Target, due to some of its characteristics not amenable to sputtering like brittleness, low thermal conductivity, etc.
2. This material has a low thermal conductivity and is susceptible to thermal shock.

Tungsten Niobium Sputtering Target Application

1. Semiconductor Manufacturing: Tungsten Niobium Sputtering Targets are utilized in the production of integrated circuits, microchips, and other electronic devices. They enable the precise deposition of thin films for interconnects, barrier layers, and contact materials, ensuring reliable electrical performance.
2. Optical Coatings: These sputtering targets are employed in the fabrication of optical coatings for lenses, mirrors, and filters. The deposited films exhibit high reflectivity, low absorption, and excellent adhesion, enhancing optical performance and durability.
3. Aerospace and Defense: Tungsten Niobium Sputtering Targets find applications in aerospace and defense industries for coating components such as turbine blades, fuel cells, and thermal barrier coatings. The targets’ high melting point and mechanical strength make them suitable for extreme operating conditions

4, Energy Storage: Tungsten Niobium Sputtering Targets are used in the production of thin films for energy storage devices like lithium-ion batteries and supercapacitors. The deposited films improve electrode performance, enabling higher energy density and improved cycling stability.

5. Research and Development: These targets are valuable in scientific research and development for studying material properties, exploring new thin-film deposition techniques, and developing advanced technologies.

Tungsten Niobium Sputtering Target Packaging

Our Tungsten Niobium Sputtering Target is carefully handled during storage and transportation to preserve the quality of our products in their original condition.

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SAM’s Tungsten Niobium Sputtering Target is available in various forms, purities, and sizes. We specialize in producing high-purity physical vapour deposition (PVD) materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapour deposition (CVD), and physical vapour deposition (PVD) display and optical applications.