(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA
(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA

ST0993 Tellurium Sputtering Target, Te

Chemical Formula Te
Catalog No. ST0993
CAS Number 13494-80-9
Purity 99.9%, 99.95%, 99.99%, 99.995%, 99.999%
Shape Discs, Plates, Column Targets, Step Targets, Custom-made

Stanford Advanced Materials (SAM) takes pride in its in-depth knowledge and experience in providing competitively priced Tellurium Sputtering Targets of exceptional purity. Backed by years of materials science expertise, SAM guarantees the delivery of top-notch targets that meet the most stringent standards in nanotechnology and thin-film deposition.




Description

Tellurium Sputtering Target Description

Tellurium Sputtering Targets stand out for their exceptional combination of properties. With high purity, they ensure consistent and defect-free deposition of films, crucial for demanding applications. Their high density offers exceptional physical strength and stability, making them suitable for rigorous industrial conditions. The low resistivity facilitates efficient electron transport, while the good electrical conductivity ensures stable electrical performance. Furthermore, Tellurium Sputtering Targets exhibit excellent thermal stability, surviving harsh environments and resisting thermal degradation. The high sputtering rate and good adhesion enable efficient film deposition and strong bonding, respectively. These unique properties make Tellurium Sputtering Targets essential components in numerous fields, including electronics, communications, energy production, and environmental protection. Their application extends to areas such as the preparation of solar cells, electronic devices, sensors, displays, and other cutting-edge technologies that require high-quality thin films.

Related Product: Germanium Antimony Telluride Sputtering Target, Copper Zinc Telluride Sputtering Target

Tellurium Sputtering Target Specifications

Compound Formula Te
Molecular Weight 127.60
Appearance Silver Grey Target
Melting Point 449.51 °C
Density 6.24 g/cm3
Available Sizes Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″

Thick: 0.125″, 0.250″

Tellurium Sputtering Target Handling Notes

  1. Indium bonding is recommended for the Tellurium Sputtering Target, due to some of its characteristics not amenable to sputtering like brittleness, low thermal conductivity, etc.
  2. This material has a low thermal conductivity and is susceptible to thermal shock.

Tellurium Sputtering Target Application

  1. Solar cell: Tellurium Sputtering Targets can be used to prepare high-efficiency solar cells, such as crystalline silicon solar cells and thin-film solar cells, Tellurium Sputtering Target‘s high purity and good conductivity make it an ideal material for the preparation of solar cells.
  2. Electronic devices: Tellurium Sputtering Targets can be used to manufacture a variety of electronic devices, such as thin film resistors, capacitors, transistors, etc. The high purity and good electrical conductivity of Tellurium Sputtering Targets make them ideal for the manufacture of electronic devices.
  3. Sensors: Tellurium Sputtering Targets can be used to manufacture a variety of sensors, such as temperature sensors, gas sensors, humidity sensors, etc. The high sensitivity and stability of Tellurium Sputtering Targets make them ideal materials for sensor manufacturing.
  4. Display: Tellurium Sputtering Target can be used to manufacture a variety of displays, such as liquid crystal displays, plasma displays, etc. The high purity and good electrical conductivity of Tellurium Sputtering Target make it an ideal material for display manufacturing.

Tellurium Sputtering Target Packaging

Our Tellurium Sputtering Target is carefully handled during storage and transportation to preserve the quality of our products in their original condition.

Get Contact

SAM’s Tellurium Sputtering Target is available in various forms, purities, and sizes. We specialize in producing high-purity physical vapour deposition (PVD) materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapour deposition (CVD), and physical vapour deposition (PVD) display and optical applications.