ST0988 Silicon Phosphorous Sputtering Target, Si-P

Silicon Phosphorous Sputtering Target Description

Silicon Phosphorous Sputtering Target is a crucial component in the production of advanced materials, offering superior sputtering performance and consistent material properties. Made of high-purity pure silicon and phosphorous, this target offers exceptional physical and chemical properties, making it suitable for a wide range of applications. It is commonly used in thin-film deposition, nano-fabrication, and other advanced manufacturing processes where precise control of material properties is essential. The consistent composition and high purity of this target ensure reliable and repeatable results in the production of high-quality materials. In addition, the target has excellent electrical conductivity and thermal stability. Good electrical conductivity enables effective current transfer during the sputtering process and improves sputtering efficiency. Thermal stability ensures that under high-power sputtering conditions, the target can maintain a low-temperature change, reducing the impact of thermal stress and thermal deformation on the sputtering process.

Related Product: Aluminum Silicon Sputtering Target, Silicon Carbide Sputtering Target

Silicon Phosphorous Sputtering Target Specifications

Silicon Phosphorous Sputtering Target Handling Notes

1. Indium bonding is recommended for the Silicon Phosphorous Sputtering Target, due to some of its characteristics not amenable to sputtering like brittleness, low thermal conductivity, etc.
2. This material has a low thermal conductivity and is susceptible to thermal shock.

Silicon Phosphorous Sputtering Target Application

1. Electronics manufacturing: Silicon Phosphorus Sputtering Targets have a wide range of applications in fields such as semiconductor devices, integrated circuits and thin film transistors. They are used to prepare thin film materials with specific properties, such as semiconductor materials, insulating layers and metal wires.
2. Optical device manufacturing: Silicon Phosphorus Sputtering Targets also have important applications in optical device manufacturing. Due to their high purity and high stability, they can be used to prepare films with high optical properties, such as transmittance enhancement films, reflective films and filters.
3. Preparation of magnetic recording media: Silicon Phosphorus Sputtering Targets are used in the preparation of magnetic recording media such as hard disc drives and magnetic tapes. They provide magnetic films with high permeability and good stability.
4. Solar cell manufacturing: Silicon Phosphorus Sputtering Targets also have important applications in solar cell manufacturing. They can be used to prepare high-efficiency, long-life solar cells and improve photoelectric conversion efficiency.
5. Decorative and architectural industry: In the decorative and architectural industry, Silicon Phosphorus Sputtering Targets are used to prepare aesthetically pleasing and durable surface coatings, such as coated glass, ceramics and stone.

Silicon Phosphorous Sputtering Target Packaging

Our Silicon Phosphorous Sputtering Target is carefully handled during storage and transportation to preserve the quality of our products in their original condition.

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SAM’s Silicon Phosphorous Sputtering Target is available in various forms, purities, and sizes. We specialize in producing high-purity physical vapour deposition (PVD) materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapour deposition (CVD), and physical vapour deposition (PVD) display and optical applications.