ST0982 Molybdenum Rhenium Sputtering Target, Mo-Re

Molybdenum Rhenium Sputtering Target Description

Rhenium and Molybdenum have high melting points and good thermal stability, allowing Molybdenum Rhenium Sputtering Targets to maintain structural stability under high-temperature conditions and are suitable for applications requiring high-temperature stability. Since both rhenium and molybdenum are good conductors, Molybdenum Rhenium Sputtering Targets have superior properties in the preparation of electronic and conductive films. These targets typically have high mechanical strength, giving them superior wear and corrosion resistance in processes. Molybdenum Rhenium Sputtering Targets are widely used in optical coatings, electronic devices, surface coatings and other high-tech fields, including semiconductor manufacturing and optoelectronics.

Related Product: Rhenium Sputtering Target, Molybdenum Sputtering Target

Molybdenum Rhenium Sputtering Target Specifications

Molybdenum Rhenium Sputtering Target Handling Notes

1. Indium bonding is recommended for the Molybdenum Rhenium Sputtering Target, due to some of its characteristics not amenable to sputtering like brittleness, low thermal conductivity, etc.
2. This material has a low thermal conductivity and is susceptible to thermal shock.

Molybdenum Rhenium Sputtering Target Application

1. Optical coatings: Molybdenum Rhenium Sputtering Targets are often used to prepare optical coatings that can be used to improve the optical properties of surfaces, such as anti-reflective coatings, mirror coatings and optical filters.
2. Electronic device preparation: Due to the superior conductive properties of rhenium and molybdenum, Molybdenum Rhenium Sputtering Targets play a key role in electronic device preparation. They are used to prepare conductive films such as metal electrodes and connecting layers.
3. Surface Coatings: These targets are also important in the field of surface coatings to improve the hardness, wear resistance and corrosion resistance of the material surface. This is critical to improving the performance and longevity of the material.
4. Semiconductor Manufacturing: Molybdenum Rhenium Sputtering Targets are widely used in semiconductor manufacturing for depositing thin film layers, including metal layers and conductive layers, to meet the requirements of semiconductor devices.
5. Optoelectronics: In the field of optoelectronics, these targets are used to prepare various devices and components such as photodiodes, solar cells, and so on.

Molybdenum Rhenium Sputtering Target Packaging

Our Molybdenum Rhenium Sputtering Target is carefully handled during storage and transportation to preserve the quality of our products in their original condition.

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SAM’s Molybdenum Rhenium Sputtering Target is available in various forms, purities, and sizes. We specialize in producing high-purity physical vapour deposition (PVD) materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapour deposition (CVD), and physical vapour deposition (PVD) display and optical applications.