| Chemical Formula | Mn-Ga |
| Catalog No. | ST0977 |
| CAS Number | – |
| Purity | 99.9%, 99.95%, 99.99%, 99.995%, 99.999% |
| Shape | Discs, Plates, Column Targets, Step Targets, Custom-made |
Widely recognized for their unparalleled purity and competitive pricing, the Manganese Gallium Sputtering Target of Stanford Advanced Materials (SAM) is a testament to excellence. Our deep knowledge of materials science, coupled with a commitment to precision craftsmanship, ensures that these targets not only meet but exceed expectations, delivering superior performance and unwavering reliability.
Manganese Gallium Sputtering Targets distinguish themselves with exceptional purity, guaranteeing a dependable and high-purity performance during thin film preparation. Their notable electrical properties, particularly evident in the semiconductor industry, position them as an ideal choice for thin film deposition processes. The alloyed combination of manganese and gallium imparts outstanding chemical stability to these targets, ensuring their steadfastness throughout thin film deposition procedures. The unique set of properties inherent in Manganese Gallium Sputtering Targets underscores their significance as a crucial material, especially in applications demanding precise and reliable thin film characteristics.
Related Product: Manganese Sputtering Target, Manganese Oxide Sputtering Target
| Compound Formula | Mn-Ga |
| Appearance | Silver Grey Target |
| Available Sizes | Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″ |
In the realm of semiconductor manufacturing, Manganese Gallium Sputtering Targets play a pivotal role. Leveraging their commendable electrical properties, these targets find extensive use in the semiconductor industry for thin film deposition. They serve as indispensable materials, offering crucial support in the preparation of electronic components and integrated circuits.
Beyond semiconductor applications, the amalgamation of Manganese and Gallium alloys equips these targets for excellence in magnetic thin film preparation. This versatility extends to diverse applications, including magnetic storage, sensors, and magnetic devices, where Manganese Gallium Sputtering Targets exhibit exceptional performance.
In the field of optical coatings, the unique physical and chemical properties of Manganese Gallium Sputtering Targets come to the forefront. Their significance lies in the preparation of optical coatings, contributing to the production of thin films with specialized optical properties, such as filters and lenses.
Expanding into the electronics sector, these targets are integral to the manufacturing of electronic devices. They play a key role in thin film preparation, enhancing the performance and stability of electronic components. The widespread utilization of Manganese Gallium Sputtering Targets underscores their instrumental contribution to advancing technology and industrial applications.
Our Manganese Gallium Sputtering Target is carefully handled during storage and transportation to preserve the quality of our products in their original condition.
SAM’s Manganese Gallium Sputtering Target is available in various forms, purities, and sizes. We specialize in producing high-purity physical vapour deposition (PVD) materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapour deposition (CVD), and physical vapour deposition (PVD) display and optical applications.
