ST0968 Gallium Oxide-Magnesium Oxide Sputtering Target, Ga2O3-MgO

Chemical Formula	Ga2O3-MgO
Catalog No.	ST0968
CAS Number	12064-13-0
Purity	99.9%, 99.95%, 99.99%, 99.995%, 99.999%
Shape	Discs, Plates, Column Targets, Step Targets, Custom-made

Stanford Advanced Materials (SAM) is a leading provider of Gallium Oxide-Magnesium Oxide Sputtering Targets, offering exceptional quality products at highly competitive prices. With a focus on innovation and precision, SAM’s targets are designed to meet the demands of the most demanding applications in the field of nanotechnology and thin-film deposition.

SKU: ST0968 Categories: Ga, Material Names D - M, Mg, O Tags: Ga2O3-MgO, Gallium Oxide-Magnesium Oxide Sputtering Target

Description

Product Overview

Stanford Advanced Materials (SAM) is proud to present our Gallium Oxide-Magnesium Oxide (Ga2O3-MgO) Sputtering Targets, designed to meet the most demanding requirements of thin-film deposition technologies. These targets are crafted from the highest-quality materials to ensure superior performance and reliability in your specialized applications. Featuring a unique blend of Gallium Oxide and Magnesium Oxide, our sputtering targets are essential for professionals in optics, electronics, and solar energy sectors, providing excellent electrical insulation, high refractive index, and outstanding corrosion resistance.

Key Benefits

Superior Electrical Insulation: Ideal for dielectric films in microelectronics.
High Refractive Index: Enhances the optical properties of coatings, perfect for mirrors and lenses.
Exceptional Corrosion Resistance: Ensures durability and longevity of coated components.

Specifications

Compound Formula	Ga2O3-MgO
Molecular Weight	227.81
Appearance	Grey Target
Available Sizes	Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″ Thick: 0.125″, 0.250″

Applications

Optical

Electronics

Solar

Research

Specialty

Optical Coatings

High-Performance Optics: Our targets are crucial in the development of advanced optical coatings used in high-end optical devices such as lasers, binoculars, and photographic lenses. These coatings significantly improve light transmission, reduce glare, and enhance the durability of optical components.
Protective Coatings: The sputtering targets are used to deposit coatings that protect sensitive optical components from scratching and environmental damage, extending the lifespan of these products.

Electronics

Insulating Layers: Ga2O3-MgO is utilized to deposit high-quality insulating layers in electronic devices, providing excellent electrical insulation that enhances device performance and longevity.
Integrated Circuits: The material’s unique properties are used to develop coatings that prevent electrical interference and enhance the efficiency of integrated circuits and microchips.

Solar Energy

Anti-Reflective Coatings: Specifically formulated for solar technology, these targets help create anti-reflective coatings that significantly increase the efficiency of solar panels. By reducing surface reflection, more sunlight is absorbed, thereby increasing the energy output.
Protective Barriers: The coatings also serve as protective barriers that shield solar cells from environmental and mechanical stresses, improving their durability and performance in varying weather conditions.

Research and Development

Material Science: Researchers use Ga2O3-MgO targets to study new material properties and their applications, including experimenting with various doping levels to create semiconductors with tailored electronic properties.
Thin Film Experimentation: These targets are instrumental in developing and testing new thin film technologies, providing researchers a high-quality material base for innovative experiments.

Specialty Applications

Thermal Barriers: Utilizing their high thermal stability, the targets are used to create coatings that act as thermal barriers in environments exposed to extreme heat, such as in aerospace engines and high-performance automotive components.
Photonic Devices: The unique dielectric properties of Gallium Oxide-Magnesium Oxide are harnessed to fabricate layers in photonic devices, which manipulate light in advanced computing and telecommunications systems.

Handling and Storage

Due to its brittleness and low thermal conductivity, we recommend indium bonding for our Gallium Oxide-Magnesium Oxide Sputtering Targets to enhance their sputtering performance. This material is also prone to thermal shock, so careful handling is necessary to maintain integrity.

Packaging

Each Gallium Oxide-Magnesium Oxide Sputtering Target is meticulously packaged to ensure it arrives in pristine condition. We utilize vacuum-sealed packaging to protect these sensitive materials during storage and transportation, preventing any potential damage or degradation.

Frequently Asked Questions (FAQ)

Q1: What makes Gallium Oxide-Magnesium Oxide Sputtering Targets suitable for optical applications?
A1: The unique composition of Gallium Oxide combined with Magnesium Oxide provides a high refractive index and excellent transparency in the visible spectrum. These properties make our targets ideal for creating advanced optical coatings that enhance the performance of mirrors, lenses, and other optical components.

Q2: Can these sputtering targets be used in semiconductor manufacturing?
A2: Yes, the excellent electrical insulation properties of Ga2O3-MgO make it suitable for semiconductor applications, where it is used to deposit thin insulating films that improve the performance and reliability of semiconductor devices.

Q3: How do the targets contribute to improving solar cell efficiency?
A3: Our Gallium Oxide-Magnesium Oxide Sputtering Targets are used to produce anti-reflective coatings on solar cells. These coatings reduce the reflection of sunlight and increase the absorption of light, thereby enhancing the overall efficiency of the solar cells.

Q4: What precautions should be taken when handling these sputtering targets?
A4: Due to the material’s brittleness and low thermal conductivity, it is crucial to handle the targets with care to avoid physical damage and thermal shock. We recommend using indium bonding to improve the sputtering performance and enhance target life.

Q5: What are the available sizes and how do I order a custom size?
A5: The standard diameters available range from 1.0″ to 6.0″, and thicknesses are 0.125″ and 0.250″. For custom sizes, please contact us directly with your specifications, and our team will work with you to meet your specific requirements.

Q6: How are the sputtering targets packaged to ensure they remain intact during transportation?
A6: Each target is vacuum-sealed to prevent oxidation and contamination. Additionally, they are packaged with protective materials that prevent movement and shock during transit, ensuring they arrive in optimal condition.

Q7: What kind of technical support does SAM offer for using these sputtering targets?
A7: SAM provides comprehensive technical support, including detailed product documentation and expert consultation to assist with setup, usage, and optimization of the sputtering targets for specific applications.

Contact Us

For more detailed information, to inquire about custom sizes, or to discuss your specific application needs, please contact Stanford Advanced Materials. We specialize in producing high-purity physical vapor deposition (PVD) materials, tailored to support advancements in semiconductor, CVD, and PVD applications within the display and optical industries.

ST0968 Gallium Oxide-Magnesium Oxide Sputtering Target, Ga2O3-MgO

Product Overview

Key Benefits

Specifications