ST0958 Calcium Vanadium Oxide Sputtering Target, CaVO3

Calcium Vanadium Oxide Sputtering Target Description

Calcium Vanadium Oxide Sputtering Targets provided by Stanford Advanced Materials (SAM) are extremely pure, ensuring that the chemical purity of the material is maintained during the deposition process. Structural stability allows for excellent performance over long periods, reducing equipment maintenance. Calcium Vanadium Oxide Sputtering Targets exhibit outstanding conductivity, which contributes to uniform deposition and improved film quality and uniformity. Besides, excellent surface flatness ensures the high quality and accuracy of deposited films. Unsurpassed thermal conductivity helps to effectively manage temperatures during the sputtering process, improving deposition efficiency.

Related Product: Calcium Fluoride Sputtering Target, Calcium Sulfide Sputtering Target

Calcium Vanadium Oxide Sputtering Target Specifications

Calcium Vanadium Oxide Sputtering Target Handling Notes

1. Indium bonding is recommended for Calcium Vanadium oxide Sputtering Targets, due to some of its characteristics not amenable to sputtering like brittleness, low thermal conductivity, etc.
2. This material has a low thermal conductivity and is susceptible to thermal shock.

Calcium Vanadium Oxide Sputtering Target Application

1. Semiconductor Manufacturing: High-purity CaVO3 ensures that deposited films have a precise chemical composition, improving the performance and stability of transistors and integrated circuits.
2. Optical Coatings: The surface flatness and purity of the target ensures uniform deposition on optical films, making it ideal for high-precision optical devices such as lasers, optical lenses, and sensors.
3. Display Technology: Calcium Vanadium oxide Sputtering Targets are used to create transparent, high-quality conductive layers in LCD and OLED screen manufacturing, improving the performance and clarity of display devices.
4. Energy Storage: As a thin film material in batteries and energy storage devices, CaVO3’s conductive and thermally conductive properties help improve the efficiency and stability of energy storage devices.
5. Conductive Coatings: Preparation of conductive thin films for sensors and electronic components ensures the reliability and long life of devices.
6. Magnetic materials research: In the sputter deposition of magnetic materials, Calcium Vanadium oxide Sputtering Targets provide a reliable basis for research in magnetic storage and magnetic sensors, contributing to the development of these fields.

Calcium Vanadium oxide Sputtering Target Packaging

Our Calcium Vanadium Oxide Sputtering Target is carefully handled during storage and transportation to preserve the quality of our products in their original condition.

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SAM’s Calcium Vanadium Oxide Sputtering Target is available in various forms, purities, and sizes. We specialize in producing high-purity physical vapor deposition (PVD) materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD), and physical vapor deposition (PVD) display and optical applications. Get an inquiry right now.