ST0955 Barium Zirconium Yttrium Oxide Sputtering Target, BZY

Barium Zirconium Yttrium Oxide Sputtering Target Description

Barium Zirconium Yttrium Oxide Sputtering Target is distinguished by its intrinsic material properties. With a unique crystal structure, it offers exceptional characteristics crucial for semiconductor applications. This specialized target ensures precision in thin film deposition, showcasing notable features that contribute to the quality demanded in electronic device manufacturing. Its inherent properties, carefully engineered, make it stand out for reliability in diverse research and industrial applications. Explore the distinct nature of Barium Zirconium Yttrium oxide, a material designed for professionals who prioritize the inherent qualities crucial for achieving excellence in thin film coating and advanced technology.

Related Product: Barium Titanate Sputtering Target, Barium Zirconate Sputtering Target

Barium Zirconium Yttrium Oxide Sputtering Target Specifications

Barium Zirconium Yttrium Oxide Sputtering Target Handling Notes

1. Indium bonding is recommended for the Barium Zirconium Yttrium Oxide Sputtering Target, due to some of its characteristics not amenable to sputtering like brittleness, low thermal conductivity, etc.
2. This material has a low thermal conductivity and is susceptible to thermal shock.

Barium Zirconium Yttrium Oxide Sputtering Target Application

1. Electronic Device Preparation: Leveraging its distinctive crystal structure and electrical characteristics, Barium Zirconium Yttrium Oxide Sputtering Targets are ideal for enhancing the performance of electronic devices through precise thin film deposition.
2. Optoelectronics: Barium Zirconium Yttrium oxide’s unique crystal structure is a focal point in optoelectronics, enabling the production of photodiodes, lasers, and other optical components with advanced properties.
3. Catalytic Applications: The presence of multiple elements in Barium Zirconium Yttrium oxide may induce catalytic activity, finding applications in chemical synthesis and energy conversion processes.
4. Magnetic Materials Research: Exploring potential magnetic properties, Barium Zirconium Yttrium Oxide Sputtering Targets contribute to magnetic materials research, with potential applications in magnetic memory devices and related studies.
5. High-Temperature Stable Materials: With inherent high thermal stability derived from its crystal structure and elemental composition, Barium Zirconium Yttrium oxide is well-suited for crafting materials in demanding high-temperature environments.

Barium Zirconium Yttrium Oxide Sputtering Target Packaging

Our Barium Zirconium Yttrium Oxide Sputtering Target is carefully handled during storage and transportation to preserve the quality of our products in their original condition.

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SAM’s Barium Zirconium Yttrium Oxide Sputtering Target is available in various forms, purities, and sizes. We specialize in producing high-purity physical vapor deposition (PVD) materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD), and physical vapor deposition (PVD) display and optical applications. Get an inquiry right now.