ST0950 Pyrolytic Graphite Sputtering Target, C

Pyrolytic Graphite Sputtering Target Description

Pyrolytic Graphite Sputtering Targets are manufactured from pyrolytic graphite by chemical vapor deposition (CVD). As the manufacturing process is different from the hot-pressing process for standard graphite targets, Pyrolytic Graphite Sputtering Targets are manufactured by chemical vapor deposition (CVD) and are grown atom by atom, so not only are impurities removed more efficiently and purity is improved, but also the directionality is superior to that of a standard graphite target, and localized effects are reduced, which allows for a significant increase in sputtering rate. It also brings better thermal and electrical properties, as well as a density close to the theory and a non-porous structure, which allows for faster outgassing. Thus, Pyrolytic Graphite Sputtering Targets have superior high-temperature stability, electrical conductivity, and chemical stability than standard graphite targets and can perform well in more demanding environments.

Related Product: Carbon Sputtering Target, Carbon Graphite Sputtering Target

Pyrolytic Graphite Sputtering Target Specifications

Pyrolytic Graphite Sputtering Target Handling Notes

1. Indium bonding is recommended for Pyrolytic Graphite Sputtering Target, due to some of its characteristics not amenable to sputtering like brittleness, low thermal conductivity, etc.
2. This material has a low thermal conductivity, and is susceptible to thermal shock.

Pyrolytic Graphite Sputtering Target Application

1. Semiconductor device preparation: Pyrolytic Graphite Sputtering Targets can be used for sputter deposition for the preparation of semiconductor devices, including thin film transistors (TFTs), photodetectors, and other integrated circuit components.

2. Optoelectronics devices: Due to their high purity and homogeneous structure, Pyrolytic Graphite Sputtering Targets are suitable for the preparation of high-performance devices used in the field of optoelectronics, such as lasers and photodetectors.

3. Conductive film preparation: Pyrolytic Graphite Sputtering Targets can be used to prepare conductive films for coating on various substrates, such as glass, plastic, etc., which are suitable for display technology, touch screens, and other fields.

4. High-temperature reactor materials: due to the thermal stability of pyrolytic graphite, it can be used to prepare materials for high-temperature reactors, such as experimental devices in chemical reactions or high-temperature environments.

5. Graphite electrodes: Pyrolytic Graphite Sputtering Targets can be used to prepare graphite electrodes for electrochemical and battery applications, where high conductivity and stability are key requirements.

6. Conductive coatings: applied to coat conductive thin layers for the preparation of a variety of electronic components and circuits, providing a highly conductive surface.

7. Magnetic materials research: In some magnetic materials research, Pyrolytic Graphite Sputtering Targets may be used to prepare thin films or structures for experiments and studies of magnetic properties.

Pyrolytic Graphite Sputtering Target Packaging

Our Pyrolytic Graphite Sputtering Target is carefully handled during storage and transportation to preserve the quality of our products in their original condition.

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SAM’s Pyrolytic Graphite Sputtering Target is available in various forms, purities, and sizes. We specialize in producing high-purity physical vapor deposition (PVD) materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD), and physical vapor deposition (PVD) display and optical applications. Get an inquiry right now.