ST0943 Tin Antimonide Sputtering Target, SnSb

Tin Antimonide Sputtering Target Description

Tin Antimonide Sputtering Targets provided by Stanford Advanced Materials (SAM) can be used in thin film deposition techniques such as Physical Vapor Deposition (PVD) and Magnetron Sputtering due to its very high purity and excellent quality, and the resulting films have good properties. Its good electrical conductivity makes it widely used in electronic devices; it can also be used to prepare semiconductor films, which are used in some electronic devices and optoelectronic devices. Tin Antimonide Sputtering Target also has magnetic properties, which can play a certain role in the magnetic storage medium.

Related Product: Tin Zinc Sputtering Target, Indium Tin Sputtering Target

Tin Antimonide Sputtering Target Specifications

Tin Antimonide Sputtering Target Handling Notes

1. Indium bonding is recommended for Tin Antimonide Sputtering Target, due to some of its characteristics not amenable to sputtering like brittleness, low thermal conductivity, etc.
2. This material has a low thermal conductivity, and is susceptible to thermal shock.

Tin Antimonide Sputtering Target Application

1. Thermoelectric materials: Tin Antimonide Sputtering Targets have potential applications in thermoelectric materials for converting thermal energy into electrical energy or vice versa. This could be useful in the areas of energy harvesting and thermoelectric power generation.
2. Semiconductor films: Tin Antimonide Sputtering Targets can prepare semiconductor films that may find applications in electronic and optoelectronic devices, such as thin-film transistors, photovoltaic cells, and so on.
3. Conductive films: Films deposited from Tin Antimonide Sputtering Target may have good electrical conductivity and are suitable for many applications where electrical conductivity is required, such as conductive films, conductive glass, etc.
4. Magnetic materials: Tin Antimonide Sputtering Targets may exhibit magnetic properties, and therefore may play a role in preparing magnetic materials, such as in magnetic storage media.
5. Thermal Management: Applications of Tin Antimonide Sputtering Targets may also involve the field of thermal management, for example in the preparation of thin films with good thermal conductivity for heat sinks or other thermal management devices.
6. Research and Development: Tin Antimonide Sputtering Targets can also be used as research and development tools for exploring new material properties and applications, especially in laboratory and academic research.

Tin Antimonide Sputtering Target Packaging

Our Tin Antimonide Sputtering Target is carefully handled during storage and transportation to preserve the quality of our products in their original condition.

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SAM’s Tin Antimonide Sputtering Target is available in various forms, purities, and sizes. We specialize in producing high-purity physical vapor deposition (PVD) materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD), and physical vapor deposition (PVD) display and optical applications. Get an inquiry right now.