Chemical Formula | MnSe |
Catalog No. | ST0936 |
CAS Number | 1313-22-0 |
Purity | 99.9%, 99.95%, 99.99%, 99.995%, 99.999% |
Shape | Discs, Plates, Column Targets, Step Targets, Custom-made |
The Manganese (II) Selenide Sputtering Target is accessible in diverse forms, purities, sizes, and price points. Stanford Advanced Materials (SAM) is a trusted supplier of premium Manganese (II) Selenide Sputtering Targets, providing outstanding performance at competitive prices.
Manganese (II) Selenide Sputtering Targets are semiconductors with dilute magnetic properties, which makes them of special application and research value in the field of semiconductors. As a sputtering target, it can be used to deposit thin films with semiconducting characteristics, making it potentially useful in electronic and optoelectronic applications.
Stanford Advanced Materials (SAM) provides high-quality Manganese (II) Selenide Sputtering Targets, offering exceptional performance at competitive prices. Our commitment to excellence ensures that our customers receive superior products that meet stringent industry standards. SAM’s Manganese (II) Selenide Sputtering Targets are meticulously crafted to deliver optimal results in various applications. With a focus on quality and affordability, SAM is your trusted partner for advanced materials solutions.
Related Product: Manganese Sulfide Sputtering Target, Manganese Dioxide Sputtering Target
Compound Formula | MnSe |
Molecular Weight | 133.90 |
Appearance | gray target |
Melting Point | – |
Density | 5.45-5.59 g/cm3 |
Available Sizes | Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″ |
Our Manganese (II) Selenide Sputtering Target is carefully handled during storage and transportation to preserve the quality of our products in their original condition.
SAM’s Manganese (II) Selenide Sputtering Target is available in various forms, purities, and sizes. We specialize in producing high-purity physical vapor deposition (PVD) materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD), and physical vapor deposition (PVD) display and optical applications.
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