| Chemical Formula | Sb2Se3 |
| Catalog No. | ST0934 |
| CAS Number | 1315-05-5 |
| Purity | 99.9%, 99.95%, 99.99%, 99.995%, 99.999% |
| Shape | Discs, Plates, Column Targets, Step Targets, Custom-made |
Antimony Triselenide Sputtering Target is manufactured by Stanford Advanced Materials (SAM) with optimal density and minimal average grain size, specifically used for applications in optoelectronic and thermoelectric technologies. The sputtering technique enables the deposition of ultra-high purity thin films of sputtered metal or oxide materials onto a solid substrate. Our targets boast exceptional purity, guaranteeing the superior quality and performance of the resulting film.
Antimony triselenide, a binary single-phase compound, is well suited for the fabrication of new low-cost and low-toxicity solar cells due to its suitable energy bandwidth, large absorption coefficient, and low crystal growth temperature. With a high Seebeck coefficient, antimony selenide is also a promising thermoelectric material.
Related Product: Antimony Sulfide Sputtering Target, Antimony Telluride Sputtering Target
| Compound Formula | Sb2Se3 |
| Molecular Weight | 480.40 |
| Appearance | gray target |
| Melting Point | 611℃ |
| Density | 5.81 g/cm3 |
| Available Sizes | Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″ |
Antimony Triselenide Sputtering Targets find extensive applications in Chemical Vapor Deposition (CVD), Physical Vapor Deposition (PVD), and optical processes. Additionally, antimony selenide exhibits promise as a thermoelectric material due to its high Seebeck coefficient, but its figure of merit is constrained by its low electrical conductivity.
Our Antimony Triselenide Sputtering Target is carefully handled during storage and transportation to preserve the quality of our products in their original condition.
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