Chemical Formula | KF |
Catalog No. | ST0927 |
CAS Number | 7789-23-3 |
Purity | 99.9%, 99.95%, 99.99%, 99.995%, 99.999% |
Shape | Discs, Plates, Column Targets, Step Targets, Custom-made |
The Potassium Fluoride Sputtering Target is available in various forms, purities, sizes, and prices. Stanford Advanced Materials (SAM) offers Potassium Fluoride Sputtering Targets renowned for exceptional quality, all at highly competitive prices.
Potassium Fluoride Sputtering Target is used in a process called sputtering, which is a technique for depositing thin films onto a substrate. Sputtering targets come in various shapes and sizes, depending on the specific requirements of the thin film deposition process and the equipment used.
In the context of sputtering, a high-energy ion beam bombards the surface of the potassium fluoride sputtering target, causing atoms or molecules to be ejected. These ejected particles then deposit onto a substrate, forming a thin film with properties inherited from the target material.
Related Product: Potassium Sputtering Target
Compound Formula | KF |
Molecular Weight | 58.10 |
Appearance | Gray target |
Melting Point (℃) | 858 |
Density (g/cm3) | 2.48 |
Available Sizes | Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″ |
Our Potassium Fluoride Sputtering Target is widely used in the production of coatings for various purposes, such as improving the wear resistance of tools, enhancing the durability of surfaces, or providing specific optical or electrical properties.
SAM’s Potassium Fluoride Sputtering Target is available in various forms, purities, and sizes. We specialize in producing high-purity physical vapor deposition (PVD) materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD), and physical vapor deposition (PVD) display and optical applications.
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