| Chemical Formula | TiCN |
| Catalog No. | ST0926 |
| CAS Number | 12654-86-3 |
| Purity | 99.9%, 99.95%, 99.99%, 99.995%, 99.999% |
| Shape | Discs, Plates, Column Targets, Step Targets, Custom-made |
The Titanium Carbonitride Sputtering Target is available in various forms, purities, sizes, and prices. Stanford Advanced Materials (SAM) boasts extensive experience in providing Titanium Carbonitride Sputtering Targets with both high purity and competitive pricing.
Titanium Carbonitride Sputtering Target is used in a process called sputtering, which is a technique for depositing thin films onto a substrate. Sputtering targets come in various shapes and sizes, depending on the specific requirements of the thin film deposition process and the equipment used. TiCN Sputtering Targets play a crucial role in the fabrication of coatings for applications where enhanced mechanical and protective properties are essential.
In the sputtering process, high-energy ions bombard the TiCN sputtering target, causing atoms or molecules to be ejected and subsequently deposited onto a substrate. The resulting thin film inherits the properties of the TiCN material.
Related Product: Titanium Boride Sputtering Target
| Compound Formula | TiCN |
| Molecular Weight | 121.75 |
| Appearance | Gray target |
| Melting Point | >350 |
| Density (g/cm3) | 5.08 |
| Available Sizes | Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″ |
Titanium Carbonitride Sputtering Target is used in applications where the resulting thin films need to exhibit properties such as hardness, wear resistance, and corrosion resistance. The use of TiCN coatings is prevalent in cutting tools, industrial components, and wear-resistant surfaces.
Our Titanium Carbonitride Sputtering Target is widely used in the production of coatings for various purposes, such as improving the wear resistance of tools, enhancing the durability of surfaces, or providing specific optical or electrical properties.
SAM’s Titanium Carbonitride Sputtering Target is available in various forms, purities, and sizes. We specialize in producing high purity physical vapor deposition (PVD) materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications.
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