Chemical Formula | Cr5B3 |
Catalog No. | ST0924 |
CAS Number | 12007-38-4 |
Purity | 99.9%, 99.95%, 99.99%, 99.995%, 99.999% |
Shape | Discs, Plates, Column Targets, Step Targets, Custom-made |
The Chromium Boride Sputtering Target is available in various forms, purities, sizes, and prices. Stanford Advanced Materials (SAM) offers Chromium Boride Sputtering Targets renowned for exceptional quality, all at highly competitive prices.
Chromium Boride Sputtering Target is used in a process called sputtering, which is a technique for depositing thin films onto a substrate. In sputtering, high-energy ions bombard a target material, causing atoms or molecules to be ejected from the target surface. These ejected particles then form a thin film on a substrate.
Applications of chromium boride sputtering targets are often used in the production of coatings for various purposes, such as improving the wear resistance of tools, enhancing the durability of surfaces, or providing specific optical or electrical properties.
Related Product: Chromium Boride Sputtering Target
Compound Formula | Cr5B3 |
Molecular Weight | 292.41 |
Appearance | Gray target |
Melting Point | 1900 |
Density (g/cm3) | 6.1 |
Available Sizes | Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″ |
Chromium Boride Sputtering Target is widely used in various applications in Photovoltaic, Thermoelectric, and Optoelectronic Devices.
Our Chromium Boride Sputtering Target is widely used in the production of coatings for various purposes, such as improving the wear resistance of tools, enhancing the durability of surfaces, or providing specific optical or electrical properties.
SAM’s Chromium Boride Sputtering Target is available in various forms, purities, and sizes. We specialize in producing high-purity physical vapor deposition (PVD) materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD), and physical vapor deposition (PVD) display and optical applications.