| Chemical Formula | Y3Fe5O12 |
| Catalog No. | ST0922 |
| CAS Number | 12063-56-8 |
| Purity | 99.9%, 99.95%, 99.99%, 99.995%, 99.999% |
| Shape | Discs, Plates, Column Targets, Step Targets, Custom-made |
The Yttrium Iron Garnet PLD Target is available in various forms, purities, sizes, and prices. Stanford Advanced Materials (SAM) offers Yttrium Iron Garnet PLD Targets renowned for exceptional quality, all at highly competitive prices.
Yttrium Iron Garnet PLD Target is a specialized material used in the sputter deposition process. Sputter deposition is a widely used technique in the production of thin films for various applications in electronics, magnetics, and optics.
YIG is known for its unique magnetic and optical properties, making it valuable in various applications. The sputter deposition process involves bombarding the target material (Yttrium Iron Garnet Sputtering Target) with high-energy ions in a vacuum chamber. This causes atoms or particles from the target material to be ejected, and these ejected particles then deposit onto a substrate, forming a thin film.
Related Product: Yttrium Oxide Sputtering Target
| Compound Formula | Y3Fe5O12 |
| Molecular Weight | 737.94 |
| Appearance | Green target |
| Melting Point | N/A |
| Density (g/cm3) | 5.11 |
| Available Sizes | Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″ |
Yttrium Iron Garnet PLD Target is widely used in various applications in electronics, magnetics, and optics.
Our Yttrium Iron Garnet PLD Target is carefully handled during storage and transportation to preserve the quality of our products in their original condition.
SAM’s Yttrium Iron Garnet PLD Target is available in various forms, purities, and sizes. We specialize in producing high purity physical vapor deposition (PVD) materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications.
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