Chemical Formula | Co/Tb/Fe |
Catalog No. | ST0918 |
CAS Number | – |
Purity | 99.9%, 99.95%, 99.99%, 99.995%, 99.999% |
Shape | Discs, Plates, Column Targets, Step Targets, Custom-made |
The Cobalt Terbium Iron Sputtering Target is available in various forms, purities, sizes, and prices. Stanford Advanced Materials (SAM) offers Cobalt Terbium Iron Sputtering Targets renowned for exceptional quality, all at highly competitive prices.
Cobalt Terbium Iron Sputtering Target is a specialized material used in the sputter deposition process. Sputter deposition is a technique employed in the production of thin films for various applications in electronics, optics, and other industries.
The sputter deposition process involves bombarding the target material (in this case, the Cobalt Terbium Iron Sputtering Target) with high-energy ions in a vacuum chamber. This bombardment causes atoms or particles from the target material to be ejected, and these particles then deposit onto a substrate, forming a thin film with similar composition and properties as the target material.
Related Product: Cobalt Oxide Sputtering Target
Compound Formula | Co/Tb/Fe |
Molecular Weight | – |
Appearance | Metallic Target |
Melting Point | – |
Density | – |
Available Sizes | Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″ |
Cobalt Terbium Iron Sputtering Targets have wide applications including magnetic storage devices, magneto-optical devices, sensors, and other electronic or optical components where the unique properties of the composite material are advantageous.
Our Cobalt Terbium Iron Sputtering Target is carefully handled during storage and transportation to preserve the quality of our products in their original condition.
SAM’s Cobalt Terbium Iron Sputtering Target is available in various forms, purities, and sizes. We specialize in producing high purity physical vapor deposition (PVD) materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD), and physical vapor deposition (PVD) display and optical applications.
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