(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA
(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA

ST0918 Cobalt Terbium Iron Sputtering Target, Co/Tb/Fe

Chemical Formula Co/Tb/Fe
Catalog No. ST0918
CAS Number
Purity 99.9%, 99.95%, 99.99%, 99.995%, 99.999%
Shape Discs, Plates, Column Targets, Step Targets, Custom-made

The Cobalt Terbium Iron Sputtering Target is available in various forms, purities, sizes, and prices. Stanford Advanced Materials (SAM) offers Cobalt Terbium Iron Sputtering Targets renowned for exceptional quality, all at highly competitive prices.




Description

Cobalt Terbium Iron Sputtering Target Description

Cobalt Terbium Iron Sputtering Target is a specialized material used in the sputter deposition process. Sputter deposition is a technique employed in the production of thin films for various applications in electronics, optics, and other industries.

The sputter deposition process involves bombarding the target material (in this case, the Cobalt Terbium Iron Sputtering Target) with high-energy ions in a vacuum chamber. This bombardment causes atoms or particles from the target material to be ejected, and these particles then deposit onto a substrate, forming a thin film with similar composition and properties as the target material.

Related Product: Cobalt Oxide Sputtering Target

Cobalt Terbium Iron Sputtering Target Specifications

Compound Formula Co/Tb/Fe
Molecular Weight
Appearance Metallic Target
Melting Point
Density
Available Sizes Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″

Thick: 0.125″, 0.250″

Cobalt Terbium Iron Sputtering Target Handling Notes

  1. Indium bonding is recommended for Cobalt Terbium Iron Sputtering Target, due to some of its characteristics not amenable to sputtering like brittleness, low thermal conductivity, etc.
  2. This material has a low thermal conductivity and is susceptible to thermal shock.

Cobalt Terbium Iron Sputtering Target Application

Cobalt Terbium Iron Sputtering Targets have wide applications including magnetic storage devices, magneto-optical devices, sensors, and other electronic or optical components where the unique properties of the composite material are advantageous.

Cobalt Terbium Iron Sputtering Target Packaging

Our Cobalt Terbium Iron Sputtering Target is carefully handled during storage and transportation to preserve the quality of our products in their original condition.

Get Contact

SAM’s Cobalt Terbium Iron Sputtering Target is available in various forms, purities, and sizes. We specialize in producing high purity physical vapor deposition (PVD) materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD), and physical vapor deposition (PVD) display and optical applications.

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Cobalt Terbium Iron Sputtering Target, Co/Tb/Fe
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