| Chemical Formula | MnO2 |
| Catalog No. | ST0916 |
| CAS Number | N/A |
| Purity | 99.9%, 99.95%, 99.99%, 99.995%, 99.999% |
| Shape | Discs, Plates, Column Targets, Step Targets, Custom-made |
The Manganese Dioxide Sputtering Target is available in various forms, purities, sizes, and prices. Stanford Advanced Materials (SAM) offers Manganese Dioxide Sputtering Targets renowned for exceptional quality, all at highly competitive prices.
Manganese Dioxide Sputtering Target is a specialized material used in the process of sputter deposition. Sputter deposition is a technique commonly employed in thin-film manufacturing and coating applications.
Manganese dioxide itself is known for its versatility and is used in batteries, catalysts, and other applications, so having a sputtering target allows for the customization and fine-tuning of thin films with specific properties for different technological purposes.
Related Product: Manganese Oxide Sputtering Target
| Compound Formula | MnO2 |
| Molecular Weight | 86.94 |
| Appearance | Black Target |
| Melting Point | >1000℃ |
| Density | – |
| Available Sizes | Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″ |
Manganese Dioxide Sputtering Target has various applications in electronics, optics, sensors, and other industries.
Our Manganese Dioxide Sputtering Target is carefully handled during storage and transportation to preserve the quality of our products in their original condition.
SAM’s Manganese Dioxide Sputtering Target is available in various forms, purities, and sizes. We specialize in producing high-purity physical vapor deposition (PVD) materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD), and physical vapor deposition (PVD) display and optical applications.
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