| Chemical Formula | LiNiO2 |
| Catalog No. | ST0914 |
| CAS Number | 12031-65-1 |
| Purity | 99.9%, 99.95%, 99.99%, 99.995%, 99.999% |
| Shape | Discs, Plates, Column Targets, Step Targets, Custom-made |
The Lithium Nickel Oxide Sputtering Target is available in various forms, purities, sizes, and prices. Stanford Advanced Materials (SAM) offers Lithium Nickel Oxide Sputtering Targets renowned for exceptional quality, all at highly competitive prices.
Lithium Nickel Oxide Sputtering Target is a specialized material used in the process of sputter deposition, a technique employed in thin-film manufacturing and coating applications.
Sputtering is a technique used to deposit thin films of material onto a substrate. It involves bombarding a target material with high-energy ions, causing atoms or molecules to be ejected from the target surface. These ejected particles then deposit onto the substrate, forming a thin film.
Lithium Nickel Oxide is a compound composed of lithium (Li), nickel (Ni), and oxygen (O) atoms. It is often used in the production of cathode materials for lithium-ion batteries. The sputtering process allows for precise control over the deposition of thin films, making it valuable in various industries, including electronics, energy storage, and optics. The use of Lithium Nickel Oxide Sputtering Targets contributes to the creation of thin films with specific properties and compositions for diverse applications.
Related Product: Lithium Nickel Cobalt Oxide Sputtering Target
| Compound Formula | LiNiO2 |
| Molecular Weight | 97.63 |
| Appearance | Gray Target |
| Melting Point | >1000℃ |
| Density | – |
| Available Sizes | Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″ |
Lithium Nickel Oxide Sputtering Target is widely used in various industries, including electronics, energy storage, and optics.
Our Lithium Nickel Oxide Sputtering Target is carefully handled during storage and transportation to preserve the quality of our products in their original condition.
SAM’s Lithium Nickel Oxide Sputtering Target is available in various forms, purities, and sizes. We specialize in producing high purity physical vapor deposition (PVD) materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications.
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