| Chemical Formula | BiVO4 |
| Catalog No. | ST0906 |
| CAS Number | 14059-33-7 |
| Purity | 99.9%, 99.95%, 99.99%, 99.995%, 99.999% |
| Shape | Discs, Plates, Column Targets, Step Targets, Custom-made |
The Bismuth Vanadate Sputtering Target is available in various forms, purities, and sizes. Stanford Advanced Materials (SAM) offers high-quality Bismuth Vanadate Sputtering Targets at the most competitive prices.
Bismuth Vanadate Sputtering Target is a specialized material used in a technique called sputter deposition. This process is a common method for depositing thin films of material onto a substrate in a controlled and precise manner.
Bismuth vanadate is a compound made up of bismuth (Bi), vanadium (V), and oxygen (O). It is known for its interesting optical and electronic properties, making it suitable for applications in areas such as solar energy conversion and photocatalysis.
Related Products: Bismuth Oxide Sputtering Target, Bismuth Selenide Sputtering Target, Bismuth Ferrite Sputtering Target
| Compound Formula | BiVO4 |
| Molecular Weight | 323.92 |
| Appearance | Yellowish solid |
| Melting Point | N/A |
| Density | 6.1 g/cm3 |
| Available Sizes | Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″ |
Bismuth Vanadate Sputtering Target is suitable for applications in areas such as solar energy conversion and photocatalysis.
Our Bismuth Vanadate Sputtering Targets are carefully handled during storage and transportation to preserve the quality of our products in their original condition.
SAM’s Bismuth Vanadate Sputtering Targets are available in various forms, purities, and sizes. We specialize in producing high-purity physical vapor deposition (PVD) materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD), and physical vapor deposition (PVD) display and optical applications.
