| Catalog No. | ST0901 |
| Chemical Formula | Co/Cr/Fe/Ni/Al |
| Purity | 99.9%, 99.95%, 99.99%, 99.995%, 99.999% |
| Shape | Discs, Plates, Column Targets, Step Targets, Custom-made |
The Cobalt Chromium Iron Nickel Aluminum High-Entropy Alloy (HEA) Sputtering Target is available in various forms, purities, sizes, and prices. Stanford Advanced Materials (SAM) offers high-quality CoCrFeNiAl High-Entropy Alloy (HEA) Sputtering Target at the most competitive prices.
CoCrFeNiAl High-Entropy Alloy (HEA) Sputtering Target is a specialized material used in the process of sputter deposition. Sputter deposition is a widely used technique in the semiconductor and thin-film industry for depositing thin films of material onto a substrate. It is commonly used in the manufacture of electronic devices, such as integrated circuits and photovoltaic cells, as well as for creating protective coatings on various surfaces.
A sputtering target is a solid material made from the material that you want to deposit as a thin film. In the case of a CoCrFeNiAl HEA Sputtering Target, the target is made from a high-entropy alloy consisting of a combination of cobalt (Co), chromium (Cr), iron (Fe), nickel (Ni), and aluminum (Al). High-entropy alloys are a relatively new class of materials known for their unique properties, such as high strength, excellent corrosion resistance, and good thermal stability.
CoCrFeNiAl High-Entropy Alloy (HEA) Sputtering Targets are commonly used in the manufacture of electronic devices, such as integrated circuits and photovoltaic cells, as well as for creating protective coatings on various surfaces.
Our CoCrFeNiAl High-Entropy Alloy (HEA) Sputtering Targets are carefully handled during storage and transportation to preserve the quality of our products in their original condition.
SAM’s CoCrFeNiAl High-Entropy Alloy (HEA) Sputtering Targets are available in various forms, purities, and sizes. We specialize in producing high-purity physical vapor deposition (PVD) materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD), and physical vapor deposition (PVD) display and optical applications. Get an inquiry right now.
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