Chemical Formula: WSi2
Catalog Number: ST0269
CAS Number: 12039-88-2
Purity: 99.5%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made
Tungsten silicide sputtering target is available in various forms, purities, sizes, and prices. Stanford Advanced Materials (SAM) offers high quality WSi2 sputtering targets at the most competitive price.
Tungsten silicide sputtering target is a type of silicide ceramic sputtering target composed of tungsten and silicon.
Tungsten, also called wolfram; wolframium, is a chemical element originated from the Swedish ‘tung sten’ meaning heavy stone(W is wolfram, the old name of the tungsten mineral wolframite). It was first mentioned in 1781 and observed by T. Bergman. The isolation was later accomplished and announced by J. and F. Elhuyar. “W” is the canonical chemical symbol of tungsten. Its atomic number in the periodic table of elements is 74 with location at Period 6 and Group 6, belonging to the d-block. The relative atomic mass of tungsten is 183.84(1) Dalton, the number in the brackets indicating the uncertainty.
Related Product: Tungsten Sputtering Target
Silicon is a chemical element originated from the Latin ‘silex’ or ‘silicis’, meaning flint. It was first mentioned in 1824 and observed by J. Berzelius. The isolation was later accomplished and announced by J. Berzelius. “Si” is the canonical chemical symbol of silicon. Its atomic number in the periodic table of elements is 14 with location at Period 3 and Group 14, belonging to the p-block. The relative atomic mass of silicon is 28.0855(3) Dalton, the number in the brackets indicating the uncertainty.
Related Product: Silicide Ceramic Sputtering Target
The tungsten silicide sputtering target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc.
Our tungsten silicide sputter targets are tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.
SAM’s tungsten silicide sputtering targets are available in various forms, purities, sizes, and prices. We specialize in producing high purity thin film coating materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Please send us an inquiry for the current prices of sputtering targets and other deposition materials that are not listed.
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Overall, I’m really impressed SAM’s WSi2 target. It’s helped my experiment get good results and it’s a very HIGH-PURITY sputtering material for the price.
