Chemical Formula: Ta5Si3
Catalog Number: ST0524
Purity: 99.9%, 99.95%, 99.99%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made
SAM’s Tantalum Silicide Sputter Targets are available in various forms, purities, sizes, and prices. We specialize in producing high-purity physical vapor deposition (PVD) materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD), and physical vapor deposition (PVD) display and optical applications.
Tantalum Silicide (TaSi2) Sputtering Targets are critical components in thin film deposition processes, widely used in semiconductor, optical, and electronics industries. Stanford Advanced Materials (SAM) offers high-quality Tantalum Silicide Sputtering Targets designed to meet the exacting demands of your applications, enabling precise thin-film coatings with exceptional performance.
Related Product: Tantalum Sputtering Target.
| Material | Tantalum Silicide (TaSi2) |
|---|---|
| Purity | 99.9% and above |
| Shape | Discs, Plates, Custom Shapes, or as per your specifications |
| Size | Dia.: 2.0″, 3.0″, 4.0″, 5.0″, 6.0″ Thick: 0.125″, 0.250″ |
| Sputtering Target Bonding Options | Indium, Elastomer, or Customized |
| Surface Roughness | As machined or as required |
| Melting Point | Approximately 2,780°C |
| Available Documents | Certificate of Analysis (COA), Material Safety Data Sheet (MSDS), and Customized Documents |
We also offer other customized shapes and sizes of the sputtering targets, please send us an inquiry for more information.
Our Tantalum Silicide Sputtering Targets are ideal for a wide range of applications, including:
Our Tantalum Silicide Sputtering Targets are tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.
Submit your review | |
Use these regularly in the lab. They work well and never had a defective piece. Great price, shipping is fast.
