(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA
(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA

ST0307 Gallium Selenide Sputtering Target, Ga2Se3

Chemical Formula: Ga2Se3
Catalog Number: ST0307
CAS Number: 12024-11-2
Purity: 99.9%, 99.95%, 99.99%, 99.995%, 99.999%
Shape:Discs, Plates, Column Targets, Step Targets, Custom-made

The gallium selenide sputtering target is available in various forms, purities, sizes, and prices. Stanford Advanced Materials (SAM) offers high-quality gallium selenide sputter targets at the most competitive prices.




Description

Gallium Selenide Sputtering Target Description

Gallium selenide sputtering target is a type of selenide ceramic sputtering target composed of gallium and selenium.

GalliumGallium is a chemical element originated from France (with the Latin name Gallia). It was first mentioned in 1875 and observed by P. E. L. de Boisbaudran. The isolation was later accomplished and announced by P. E. L. de Boisbaudran. “Ga” is the canonical chemical symbol of gallium. Its atomic number in the periodic table of elements is 31 with location at Period 4 and Group 13, belonging to the p-block. The relative atomic mass of gallium is 69.723(1) Dalton, the number in the brackets indicating the uncertainty.

Related Product: Gallium Sputtering Target

SeleniumSelenium is a chemical element originated from Moon (with the Greek name selene). It was first mentioned in 1817 and observed by J. Berzelius and G. Gahn. The isolation was later accomplished and announced by J. Berzelius and G. Gahn. “Se” is the canonical chemical symbol of selenium. Its atomic number in the periodic table of elements is 34 with location at Period 4 and Group 16, belonging to the p-block. The relative atomic mass of selenium is 78.96(3) Dalton, the number in the brackets indicating the uncertainty.

Related Product: Selenide Ceramic Sputtering Target

Gallium Selenide Sputtering Target Specification

Compound Formula Ga2Se3
CAS No. 12024-11-2
Density 4.92 g/cm3
Melting Point 1,020 °C
Available Sizes Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″

Gallium Selenide Sputtering Target Application

The gallium selenide sputtering target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc.

Gallium Selenide Sputtering Target Packing

Our gallium selenide sputter targets are tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.

Get Contact

SAM’s gallium selenide sputtering targets are available in various forms, purities, sizes, and prices. We specialize in producing high purity thin film coating materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Please send us an inquiry for the current prices of sputtering targets and other deposition materials that are not listed.

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Gallium Selenide Sputtering Target, Ga2Se3
Average rating:  
 2 reviews
by Thomas Massey on Gallium Selenide Sputtering Target, Ga2Se3

Bought them for my lab experiment, worked great!

by Mark Twain on Gallium Selenide Sputtering Target, Ga2Se3

I use these targets in my chemical processing projects. these work great