Chemical Formula: Ti
Catalog Number: ST0053
CAS Number: 7440-32-6
Purity: 99.2%-99.7%, 99.97%-99.98%, >99.99%, 99.995%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made
Titanium sputtering target is available in various forms, purities, sizes, and prices. Stanford Advanced Materials (SAM) is a trusted sputtering target supplier working with international partners to bring you the highest quality products with the most affordable pricing.
Titanium Sputtering Target Safety Data Sheet
Titanium Sputtering Target is made of titanium metal. Titanium is a Group IV transition metal that has enjoyed great interest as one of the most important biocompatible metals, thanks to a suite of suitable biological and biomechanical properties. It is a lustrous transition metal with a silver color, low density, and high strength. Titanium is resistant to corrosion in seawater, aqua regia, and chlorine.cIts strong, lightweight characteristics and excellent corrosion resistance make it ideal for ocean liner hulls, aircraft engines, and designer jewelry. The titanium sputtering target is used for CD-ROM, decoration, flat panel displays, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc.
Material Type | Titanium |
Symbol | Ti |
Color/Appearance | Silvery Metallic |
Melting Point | 1,660°C |
Theoretical Density | 4.5(g/cc) |
Sputter | DC |
Comments | Alloys with W/Ta/Mo; evolves gas on first heating. |
Available Sizes | Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″ Thick: 0.125″, 0.250″ |
We also offer other customized shapes and sizes of the sputtering targets, please send us an inquiry for more information.
High performance titanium sputtering materials are used for thin film coating applications, CD-ROM, decoration, flat panel displays, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc.
Chemical plants:
Titanium is highly corrosion resistant. It is used in many types of chemical equipment. About 30% of titanium used domestically is for chemical plants.
Seawater usage:
Titanium is greatly used in nuclear and fossil power stations. It is used for the big heat exchanger, CONDENSOR, which cools the steam form the turbine with seawater which does not corrode so the wall thickness of the tube is as thin as 0.5 mm. Condensor tubes consume about 20% of domestic titanium consumption.
Titanium in daily life:
Recently, titanium is being used in many goods we use such as in sports, building material, medical applications and accessories. This amounts to about 30% of domestic consumption.
Aerospace:
In the USA, about 70% of titanium produced is used for aerospace parts. In Japan only 2-3% of the titanium is consumed for aerospace usage. Thus, there is a big difference of market structure between Japan and USA.
Our planar titanium sputtering targets have high purity & density and uniform microstructure that can be perfectly applied in depositing thin films in TFT displays and other related industries. Both single and multi-piece titanium planar targets are available.
Our rotatory titanium sputtering targets have a high utilization rate of more than 75% that ensure you make full use of the target materials.
Indium Bonding and Elastomeric Target Bonding Service are available for Ti Sputtering Target. Stanford Advanced Materials is devoted to machining standard backing plates and working together with the Taiwan Bonding Company for providing bonding services. For questions about target bonding materials, methods and services, please click here.
Our titanium sputter targets are carefully handled to prevent damage during storage and transportation and to preserve the quality of our products in their original condition.
High-purity titanium sputtering target is available in various forms, purities, sizes, and prices. We specialize in producing high-purity thin film coating materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD), and physical vapor deposition (PVD) display and optical applications. Please send us an inquiry for current pricing on sputtering targets and other deposition materials not listed.
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So far it's been really awesome and I highly recommend it.
Five stars. Shipping was fairly quick. Product was exactly as expected.