ST0033 Niobium Sputtering Target, Nb

Niobium Sputtering Target Description

Niobium sputtering target shares properties with its source material. Niobium is a silver-colored metal that is generally found in conjunction with tantalum, the two elements being separated by fractional crystallization of their respective fluoro-complexes. It has an abundance of 20 ppm in the earth’s crust. As a pure metal, it is very reactive and forms an extremely stable oxide when exposed to air which enhances its corrosion resistance. Niobium will react with a variety of non-metals at elevated temperatures.

Related Product: Titanium Sputtering Target

Niobium Sputtering Target Specification

We also offer other customized shapes and sizes of the sputtering targets, please send us an inquiry for more information.

Niobium Sputtering Target Application

Niobium sputter targets are used for thin film deposition, typically for fuel cell, decoration, semiconductor, display, LED and photovoltaic devices, glass coating, etc. Other applications of niobium include:

Steel production

Niobium is an effective microalloying element for steel, within which it forms niobium carbide and niobium nitride. These compounds improve the grain refining, and retard recrystallization and precipitation hardening. These same niobium alloys are often used in pipeline construction.

Superalloys

Quantities of niobium are used in nickel-, cobalt-, and iron-based superalloys in proportions as great as 6.5% for such applications as jet engine components, gas turbines, rocket subassemblies, turbocharger systems, heat-resisting, and combustion equipment. Niobium precipitates a hardening γ”-phase within the grain structure of the superalloy.

Superconducting magnets

Niobium-germanium (Nb3Ge), niobium-tin (Nb3Sn), as well as the niobium-titanium alloys are used as a type II superconductor wire for superconducting magnets. These superconducting magnets are used in magnetic resonance imaging and nuclear magnetic resonance instruments as well as in particle accelerators.

Niobium Sputtering Target Bonding Services

Indium Bonding and Elastomeric Target Bonding Service are available for the niobium sputtering target. Stanford Advanced Materials (SAM) is devoted to machining standard backing plates and working together with the Taiwan Bonding Company for providing bonding services. For questions about target bonding materials, methods and services, please click here.

Packing

The high purity niobium sputtering targets from Stanford Advanced Materials are clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.

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High purity niobium sputtering target is available in various forms, purities, sizes, and prices. We specialize in producing high purity thin film coating materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Please send us an inquiry for current pricing on sputtering targets and other deposition materials not listed.